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1. WO2020117356 - TECHNIQUES DE FABRICATION D'UN PUITS D’ÉCHANTILLON ET STRUCTURES POUR DISPOSITIFS CAPTEURS INTÉGRÉS

Numéro de publication WO/2020/117356
Date de publication 11.06.2020
N° de la demande internationale PCT/US2019/052994
Date du dépôt international 25.09.2019
CIB
B01L 3/00 2006.01
BTECHNIQUES INDUSTRIELLES; TRANSPORTS
01PROCÉDÉS OU APPAREILS PHYSIQUES OU CHIMIQUES EN GÉNÉRAL
LAPPAREILS DE LABORATOIRE POUR LA CHIMIE OU LA PHYSIQUE, À USAGE GÉNÉRAL
3Récipients ou ustensiles pour laboratoires, p.ex. verrerie de laboratoire; Compte-gouttes
CPC
B01J 2219/00317
BPERFORMING OPERATIONS; TRANSPORTING
01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
2219Chemical, physical or physico-chemical processes in general; Their relevant apparatus
00274Sequential or parallel reactions; Apparatus and devices for combinatorial chemistry or for making arrays; Chemical library technology
00277Apparatus
00279Features relating to reactor vessels
00306Reactor vessels in a multiple arrangement
00313the reactor vessels being formed by arrays of wells in blocks
00315Microtiter plates
00317Microwell devices, i.e. having large numbers of wells
B01J 2219/00621
BPERFORMING OPERATIONS; TRANSPORTING
01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
2219Chemical, physical or physico-chemical processes in general; Their relevant apparatus
00274Sequential or parallel reactions; Apparatus and devices for combinatorial chemistry or for making arrays; Chemical library technology
00583Features relative to the processes being carried out
00603Making arrays on substantially continuous surfaces
00605the compounds being directly bound or immobilised to solid supports
00614Delimitation of the attachment areas
00621by physical means, e.g. trenches, raised areas
B01J 2219/00637
BPERFORMING OPERATIONS; TRANSPORTING
01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
2219Chemical, physical or physico-chemical processes in general; Their relevant apparatus
00274Sequential or parallel reactions; Apparatus and devices for combinatorial chemistry or for making arrays; Chemical library technology
00583Features relative to the processes being carried out
00603Making arrays on substantially continuous surfaces
00605the compounds being directly bound or immobilised to solid supports
00632Introduction of reactive groups to the surface
00637by coating it with another layer
B01L 2200/12
BPERFORMING OPERATIONS; TRANSPORTING
01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
LCHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
2200Solutions for specific problems relating to chemical or physical laboratory apparatus
12Specific details about manufacturing devices
B01L 2300/0636
BPERFORMING OPERATIONS; TRANSPORTING
01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
LCHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
2300Additional constructional details
06Auxiliary integrated devices, integrated components
0627Sensor or part of a sensor is integrated
0636Integrated biosensor, microarrays
B01L 2300/0829
BPERFORMING OPERATIONS; TRANSPORTING
01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
LCHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
2300Additional constructional details
08Geometry, shape and general structure
0809rectangular shaped
0829Multi-well plates; Microtitration plates
Déposants
  • QUANTUM-SI INCORPORATED [US]/[US]
Inventeurs
  • CHEN, Guojun
  • BEACH, James
  • CROCE, Kathren
  • LACKEY, Jeremy
  • SCHMID, Gerard
Mandataires
  • PRITZKER, Randy J.
  • BAKER, C., Hunter
  • AMUNDSEN, Eric, L.
  • ATTISHA, Michael, J.
  • ALAM, Saad
Données relatives à la priorité
62/774,67303.12.2018US
Langue de publication anglais (EN)
Langue de dépôt anglais (EN)
États désignés
Titre
(EN) SAMPLE WELL FABRICATION TECHNIQUES AND STRUCTURES FOR INTEGRATED SENSOR DEVICES
(FR) TECHNIQUES DE FABRICATION D'UN PUITS D’ÉCHANTILLON ET STRUCTURES POUR DISPOSITIFS CAPTEURS INTÉGRÉS
Abrégé
(EN)
A method of forming an integrated device includes forming a sample well within a cladding layer of a substrate; forming a sacrificial spacer layer over the substrate and into the sample well; performing a directional etch of the sacrificial spacer layer so as to form a sacrificial sidewall spacer on sidewalls of the sample well; forming, over the substrate and into the sample well, a functional layer that provides a location for attachment of a biomolecule; and removing the sacrificial spacer material.
(FR)
L'invention concerne un procédé de formation d'un dispositif intégré qui comprend la formation d'un puits d'échantillon à l'intérieur d'une couche de gainage d'un substrat ; la formation d'une couche d'espacement sacrificielle sur le substrat et dans le puits d'échantillon ; la réalisation d'une gravure directionnelle de la couche d'espacement sacrificielle de façon à former un espaceur de paroi latérale sacrificielle sur les parois latérales du puits d'échantillon ; la formation, sur le substrat et dans le puits d'échantillon, d'une couche fonctionnelle qui fournit un emplacement pour la fixation d'une biomolécule ; et le retrait du matériau d'espacement sacrificiel.
Dernières données bibliographiques dont dispose le Bureau international