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1. WO2020018079 - COMMANDE DE CYCLE DE SERVICE, DE PROFONDEUR ET D'ÉNERGIE DE SURFACE EN NANO-FABRICATION

Note: Texte fondé sur des processus automatiques de reconnaissance optique de caractères. Seule la version PDF a une valeur juridique

[ EN ]

WHAT IS CLAIMED IS:

1. A method of fabricating a nanoimprint lithography (NIL) mold with a target surface-relief structure, the method comprising:

manufacturing a preliminary surface-relief structure of the NIL mold, the preliminary surface-relief structure comprising a plurality of ridges, wherein a parameter of the preliminary surface-relief structure is different from a corresponding parameter of the target surface-relief structure; and

modifying the parameter of the preliminary surface-relief structure to make the target surface-relief structure, wherein modifying the parameter of the preliminary surface-relief structure comprises:

depositing a material layer on the preliminary surface-relief structure; and etching or surface-treating the material layer.

2. The method of claim 1 , wherein the NIL mold comprises a master NIL mold or a soft stamp for nanoimprint lithography.

3. The method of claim 1, wherein the parameter of the preliminary surface-relief structure comprises a width of each of the plurality of ridges.

4. The method of claim 3, wherein modifying the parameter of the preliminary surface-relief structure comprises:

depositing a spacer layer on the preliminary surface-relief structure; and anisotropically etching the spacer layer to remove the spacer layer on top of the plurality of ridges and the spacer layer between the plurality of ridges, and to keep the spacer layer on sidewalls of the plurality of ridges.

5. The method of claim 4, wherein the etching comprises plasma etching, ion beam etching, reactive ion beam etching, or chemical assisted reactive ion beam etching.

6. The method of claim 1 , wherein the parameter of the preliminary surface-relief structure comprises a height of each of the plurality of ridges.

7. The method of claim 6, wherein modifying the parameter of the preliminary surface-relief structure comprises:

depositing the material layer on the preliminary surface-relief structure using a vapor deposition process; and

etching the material layer using a wet or dry isotropic etching process.

8. The method of claim 1, wherein the parameter of the preliminary surface-relief structure comprises a surface energy of the preliminary surface-relief structure.

9. The method of claim 8, wherein modifying the parameter of the preliminary surface-relief structure comprises:

depositing a spacer layer on the preliminary surface-relief structure, wherein the spacer layer has a surface energy different from the surface energy of the preliminary surface-relief structure; and

surface-treating the spacer layer.

10. The method of claim 9, wherein surface-treating the spacer layer comprises:

treating a surface of the spacer layer using hexamethyldisilazane (HMDS) or fluorinated self-assembled monolayer (FSAM).

11. The method of claim 1 , wherein:

the plurality of ridges comprises slanted ridges; and

the parameter of the preliminary surface-relief structure comprises a slant angle of an edge of the slanted ridges.

12. The method of claim 11, wherein modifying the parameter of the preliminary surface-relief structure comprises:

depositing a spacer layer on the preliminary surface-relief structure; and etching the spacer layer at a slanted angle using a plasma or ion beam.

13. The method of claim 1, wherein the preliminary surface-relief structure comprises a slanted surface-relief grating structure.

14. A method of fabricating a surface-relief grating, the method comprising: manufacturing a preliminary surface-relief grating on a substrate, the preliminary surface-relief grating comprising a plurality of ridges, wherein a parameter of the preliminary surface-relief grating is different from a corresponding parameter of the surface-relief grating; and

modifying the parameter of the preliminary surface-relief grating to make the surface-relief grating, wherein modifying the parameter of the preliminary surface-relief grating comprises:

depositing a material layer on the preliminary surface-relief grating; and etching the material layer.

15. The method of claim 14, wherein the parameter of the preliminary surface-relief grating comprises:

a width of each of the plurality of ridges;

a height of each of the plurality of ridges; or

a slant angle of an edge of each of the plurality of ridges.

16. The method of claim 14, wherein:

a slant angle of an edge of each of the plurality of ridges is greater than 20°.

17. The method of claim 14, wherein:

a depth of the plurality of ridges is greater than 20 nm.

18. A method of fabricating a target nanoimprint lithography (NIL) mold, the method comprising:

manufacturing a preliminary NIL mold, the preliminary NIL mold comprising a substrate and a plurality of ridges on the substrate;

depositing a material layer on the preliminary NIL mold; and

etching or surface-treating the material layer on the preliminary NIL mold to achieve the target NIL mold.

19. The method of claim 18, wherein the depositing and the etching or surface-treating modify at least one of:

a width of each of the plurality of ridges;

a height of each of the plurality of ridges;

a surface energy of the preliminary NIL mold; or a slant angle of an edge of the plurality of ridges.

20. The method of claim 18, wherein:

the plurality of ridges form a slanted surface-relief grating.