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1. WO2012077137 - NANOCOMPOSITE DE POLYMÈRE MULTIFONCTIONNEL SUR LEQUEL PEUT ÊTRE PHOTOFORMÉ UN MOTIF

Numéro de publication WO/2012/077137
Date de publication 14.06.2012
N° de la demande internationale PCT/IN2011/000839
Date du dépôt international 07.12.2011
CIB
G03C 5/00 2006.01
GPHYSIQUE
03PHOTOGRAPHIE; CINÉMATOGRAPHIE; TECHNIQUES ANALOGUES UTILISANT D'AUTRES ONDES QUE DES ONDES OPTIQUES; ÉLECTROGRAPHIE; HOLOGRAPHIE
CMATÉRIAUX PHOTOSENSIBLES POUR LA PHOTOGRAPHIE; PROCÉDÉS PHOTOGRAPHIQUES, p.ex. PROCÉDÉS CINÉMATOGRAPHIQUES, AUX RAYONS X, EN COULEURS OU STÉRÉOPHOTOGRAPHIQUES; PROCÉDÉS AUXILIAIRES EN PHOTOGRAPHIE
5Procédés photographiques ou agents à cet effet; Régénération de tels agents de traitement
CPC
G03F 7/004
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004Photosensitive materials
G03F 7/0047
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004Photosensitive materials
0047characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
G03F 7/0385
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004Photosensitive materials
038Macromolecular compounds which are rendered insoluble or differentially wettable
0385using epoxidised novolak resin
G03F 7/20
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20Exposure; Apparatus therefor
Y10T 428/24893
YSECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
10TECHNICAL SUBJECTS COVERED BY FORMER USPC
TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
428Stock material or miscellaneous articles
24Structurally defined web or sheet [e.g., overall dimension, etc.]
24802Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
24893including particulate material
Déposants
  • INDIAN INSTITUTE OF TECHNOLOGY, BOMBAY [IN]/[IN] (AllExceptUS)
  • RAO, Ramgopal [IN]/[IN] (UsOnly)
  • KOVUR, Prashanthi [IN]/[IN] (UsOnly)
Inventeurs
  • RAO, Ramgopal
  • KOVUR, Prashanthi
Mandataires
  • DESOUZA, Fiona
Données relatives à la priorité
3373/MUM/201010.12.2010IN
Langue de publication anglais (EN)
Langue de dépôt anglais (EN)
États désignés
Titre
(EN) A PHOTO-PATTERNABLE MULTIFUNCTIONAL POLYMER NANOCOMPOSITE
(FR) NANOCOMPOSITE DE POLYMÈRE MULTIFONCTIONNEL SUR LEQUEL PEUT ÊTRE PHOTOFORMÉ UN MOTIF
Abrégé
(EN)
The invention provides a photo-patternable multifunctional polymer nanocomposite. The nanocomposite comprises a solvent suspension of multiferroic nanostructures uniformly dispersed in SU-8 polymer matrix. The invention also provides a composite comprising a substrate and a photo-patterned multifunctional polymer nanocomposite layer formed on the substrate. The nanocomposite layer comprises a UV-photolithographed SU-8 polymer having a solvent suspension of multiferroic nanostructures uniformly dispersed in the polymer matrix.
(FR)
L'invention concerne un nanocomposite multifonctionnel sur lequel peut être photoformé un motif. Le nanocomposite comprend une suspension dans un solvant de nanostructures multiferroïques uniformément dispersées dans une matrice de polymère SU-8. L'invention concerne également un composite comprenant un substrat et une couche de nanocomposite de polymère multifonctionnel sur lequel peut être photoformé un motif, formée sur le substrat. La couche de nanocomposite comprend un polymère SU-8 photolithographié aux UV avec une suspension dans un solvant de nanostructures multiferroïques uniformément dispersées dans la matrice de polymère.
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