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1. WO2009134635 - AUTO-ASSEMBLAGE GRAPHOÉPITAXIAL DE RÉSEAUX DE DEMI-CYLINDRES FACE VERS LE BAS

Numéro de publication WO/2009/134635
Date de publication 05.11.2009
N° de la demande internationale PCT/US2009/041125
Date du dépôt international 20.04.2009
CIB
B81C 1/00 2006.01
BTECHNIQUES INDUSTRIELLES; TRANSPORTS
81TECHNOLOGIE DES MICROSTRUCTURES
CPROCÉDÉS OU APPAREILS SPÉCIALEMENT ADAPTÉS À LA FABRICATION OU AU TRAITEMENT DE DISPOSITIFS OU DE SYSTÈMES À MICROSTRUCTURE
1Fabrication ou traitement de dispositifs ou de systèmes dans ou sur un substrat
CPC
B81C 1/00031
BPERFORMING OPERATIONS; TRANSPORTING
81MICROSTRUCTURAL TECHNOLOGY
CPROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
1Manufacture or treatment of devices or systems in or on a substrate
00015for manufacturing microsystems
00023without movable or flexible elements
00031Regular or irregular arrays of nanoscale structures, e.g. etch mask layer
B81C 2201/0149
BPERFORMING OPERATIONS; TRANSPORTING
81MICROSTRUCTURAL TECHNOLOGY
CPROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
2201Manufacture or treatment of microstructural devices or systems
01in or on a substrate
0101Shaping material; Structuring the bulk substrate or layers on the substrate; Film patterning
0147Film patterning
0149Forming nanoscale microstructures using auto-arranging or self-assembling material
B81C 2201/0198
BPERFORMING OPERATIONS; TRANSPORTING
81MICROSTRUCTURAL TECHNOLOGY
CPROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
2201Manufacture or treatment of microstructural devices or systems
01in or on a substrate
0198for making a masking layer
B82Y 30/00
BPERFORMING OPERATIONS; TRANSPORTING
82NANOTECHNOLOGY
YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
30Nanotechnology for materials or surface science, e.g. nanocomposites
G03F 7/0002
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
0002Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
H01L 21/02118
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
02Manufacture or treatment of semiconductor devices or of parts thereof
02104Forming layers
02107Forming insulating materials on a substrate
02109characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
02112characterised by the material of the layer
02118carbon based polymeric organic or inorganic material, e.g. polyimides, poly cyclobutene or PVC
Déposants
  • MICRON TECHNOLOGY, INC. [US]/[US] (AllExceptUS)
  • MILLWARD, Dan, B. [US]/[US] (UsOnly)
  • WESTMORELAND, Donald [US]/[US] (UsOnly)
Inventeurs
  • MILLWARD, Dan, B.
  • WESTMORELAND, Donald
Mandataires
  • STRODTHOFF, Kristine, M.
Données relatives à la priorité
12/114,17302.05.2008US
Langue de publication anglais (EN)
Langue de dépôt anglais (EN)
États désignés
Titre
(EN) GRAPHOEPITAXIAL SELF-ASSEMBLY OF ARRAYS OF HALF-CYLINDERS FORMED ON A SUBSTRATE
(FR) AUTO-ASSEMBLAGE GRAPHOÉPITAXIAL DE RÉSEAUX DE DEMI-CYLINDRES FACE VERS LE BAS
Abrégé
(EN)
Methods for fabricating sublithographic, nanoscale microslructures in line arrays utilizing self-assembling block copolymers, and films and devices formed from these methods are provided.
(FR)
L'invention porte sur des procédés pour fabriquer des microstructures à l'échelle nanométrique, sous-lithographiques, dans des réseaux en ligne à l'aide de copolymères séquencés à auto-assemblage, et sur des films et des dispositifs formés à partir de ces procédés.
Dernières données bibliographiques dont dispose le Bureau international