Traitement en cours

Veuillez attendre...

Paramétrages

Paramétrages

Aller à Demande

1. KR1020050023316 - ROTARY TYPE MASS-PRODUCING CVD FILM FORMING DEVICE AND METOD OF FORMING CVD FILM ON SURFACE IN PLASTIC CONTEINER

Office
République de Corée
Numéro de la demande 1020047020694
Date de la demande 18.12.2004
Numéro de publication 1020050023316
Date de publication 09.03.2005
Numéro de délivrance 1010895350000
Date de délivrance 05.12.2011
Type de publication B1
CIB
B65D 23/02
BTECHNIQUES INDUSTRIELLES; TRANSPORTS
65MANUTENTION; EMBALLAGE; EMMAGASINAGE; MANIPULATION DES MATÉRIAUX DE FORME PLATE OU FILIFORME
DRÉCEPTACLES POUR L'EMMAGASINAGE OU LE TRANSPORT D'OBJETS OU DE MATÉRIAUX, p.ex. SACS, TONNEAUX, BOUTEILLES, BOÎTES, BIDONS, CAISSES, BOCAUX, RÉSERVOIRS, TRÉMIES OU CONTENEURS D'EXPÉDITION; ACCESSOIRES OU FERMETURES POUR CES RÉCEPTACLES; ÉLÉMENTS D'EMBALLAGE; PAQUETS
23Parties constitutives des bouteilles ou pots non prévues ailleurs
02Garnitures ou revêtements internes
C23C 16/26
CCHIMIE; MÉTALLURGIE
23REVÊTEMENT DE MATÉRIAUX MÉTALLIQUES; REVÊTEMENT DE MATÉRIAUX AVEC DES MATÉRIAUX MÉTALLIQUES; TRAITEMENT CHIMIQUE DE SURFACE; TRAITEMENT DE DIFFUSION DE MATÉRIAUX MÉTALLIQUES; REVÊTEMENT PAR ÉVAPORATION SOUS VIDE, PAR PULVÉRISATION CATHODIQUE, PAR IMPLANTATION D'IONS OU PAR DÉPÔT CHIMIQUE EN PHASE VAPEUR, EN GÉNÉRAL; MOYENS POUR EMPÊCHER LA CORROSION DES MATÉRIAUX MÉTALLIQUES, L'ENTARTRAGE OU LES INCRUSTATIONS, EN GÉNÉRAL
CREVÊTEMENT DE MATÉRIAUX MÉTALLIQUES; REVÊTEMENT DE MATÉRIAUX AVEC DES MATÉRIAUX MÉTALLIQUES; TRAITEMENT DE SURFACE DE MATÉRIAUX MÉTALLIQUES PAR DIFFUSION DANS LA SURFACE, PAR CONVERSION CHIMIQUE OU SUBSTITUTION; REVÊTEMENT PAR ÉVAPORATION SOUS VIDE, PAR PULVÉRISATION CATHODIQUE, PAR IMPLANTATION D'IONS OU PAR DÉPÔT CHIMIQUE EN PHASE VAPEUR, EN GÉNÉRAL
16Revêtement chimique par décomposition de composés gazeux, ne laissant pas de produits de réaction du matériau de la surface dans le revêtement, c. à d. procédés de dépôt chimique en phase vapeur (CVD)
22caractérisé par le dépôt de matériaux inorganiques, autres que des matériaux métalliques
26Dépôt uniquement de carbone
CPC
C23C 16/045
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
16Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
04Coating on selected surface areas, e.g. using masks
045Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
C23C 16/26
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
16Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
22characterised by the deposition of inorganic material, other than metallic material
26Deposition of carbon only
C23C 16/505
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
16Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
44characterised by the method of coating
50using electric discharges
505using radio frequency discharges
C23C 16/54
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
16Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
44characterised by the method of coating
54Apparatus specially adapted for continuous coating
B65D 23/02
BPERFORMING OPERATIONS; TRANSPORTING
65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
DCONTAINERS FOR STORAGE OR TRANSPORT OF ARTICLES OR MATERIALS, e.g. BAGS, BARRELS, BOTTLES, BOXES, CANS, CARTONS, CRATES, DRUMS, JARS, TANKS, HOPPERS, FORWARDING CONTAINERS; ACCESSORIES, CLOSURES, OR FITTINGS THEREFOR; PACKAGING ELEMENTS; PACKAGES
23Details of bottles or jars not otherwise provided for
02Linings or internal coatings
Déposants MITSUBISHI SHOJI PLASTICS CORPORATION
YOUTEC CO., LTD.
미쯔비시 쇼지 플라스틱 가부시키가이샤
가부시키가이샤 유테크
Inventeurs HAMA KENICHI
하마겐이치
KAGE TSUYOSHI
가게츠요시
KOBAYASHI TAKUMI
고바야시다쿠미
KAWABE TAKEHARU
가와베다케하루
Mandataires 특허법인코리아나
Données relatives à la priorité 2002183309 24.06.2002 JP
Titre
(EN) ROTARY TYPE MASS-PRODUCING CVD FILM FORMING DEVICE AND METOD OF FORMING CVD FILM ON SURFACE IN PLASTIC CONTEINER
(KO) 대량 생산용 로터리형 CVD 막형성장치 및 플라스틱용기 내부 표면상의 CVD 막형성방법
Abrégé
(EN)

A rotary type, mass-producing CVD film forming device having high-frequency power supplies and matching boxes fewer than film-forming chambers. The device is characterized by comprising a plurality of column-shaped film-forming chambers each storing a plastic container and provided circularly on a rotary support at equal intervals, a material gas introducing means for introducing a material gal into a container stored in each film-forming chamber via a material gas supply pipe doubling as an internal electrode, and a high- frequency wave supply means for supplying high-frequency wave to an external electrode doubling as part of each film-forming chamber.

© KIPO & WIPO 2007


(KO) 대량 생산용 로터리형 CVD 막형성장치에서는, 하나의 수용공간에 하나의 플라스틱 용기를 수용하는 복수의 수용공간들을 구비하고 외부전극으로 기능하는 하나의 주상체를 제공함으로써, 막형성 챔버가 형성되고, 회전 지지체상에 원형으로 등간격으로 막형성 챔버들이 배치되며, 막형성 챔버들의 각각에 수용되는 플라스틱 용기들 내부에 플라즈마로 전환되는 원료가스를 도입하는 원료가스 도입수단이 제공되고, 막형성 챔버들 각각의 외부전극에 고주파를 공급하는 고주파 공급수단이 제공되어, 플라스틱 용기들의 내부 표면상에 CVD (화학 기상 성장) 막을 형성한다.
Documents de brevet associés
PH12004502004Cette demande ne peut pas être visualisée dans PATENTSCOPE car les données relatives à l'ouverture de la phase nationale n'ont pas encore été publiées ou sont émises par un pays qui ne partage pas de données avec l'OMPI ou il y a un problème de formatage ou d'indisponibilité de la demande.
PH1-2004-502004Cette demande ne peut pas être visualisée dans PATENTSCOPE car les données relatives à l'ouverture de la phase nationale n'ont pas encore été publiées ou sont émises par un pays qui ne partage pas de données avec l'OMPI ou il y a un problème de formatage ou d'indisponibilité de la demande.