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1. JPWO2016111280 - 圧電薄膜及び圧電振動子

Office
Japon
Numéro de la demande 2016568718
Date de la demande 05.01.2016
Numéro de publication WO2016111280
Date de publication 14.07.2016
Numéro de délivrance 6468468
Date de délivrance 25.01.2019
Type de publication B2
CIB
H03H 9/24
HÉLECTRICITÉ
03CIRCUITS ÉLECTRONIQUES FONDAMENTAUX
HRÉSEAUX D'IMPÉDANCES, p.ex. CIRCUITS RÉSONNANTS; RÉSONATEURS
9Réseaux comprenant des éléments électromécaniques ou électro-acoustiques; Résonateurs électromécaniques
24Détails de réalisation de résonateurs en matériau qui n'est ni piézo-électrique, ni électrostrictif, ni magnétostrictif
H03H 9/17
HÉLECTRICITÉ
03CIRCUITS ÉLECTRONIQUES FONDAMENTAUX
HRÉSEAUX D'IMPÉDANCES, p.ex. CIRCUITS RÉSONNANTS; RÉSONATEURS
9Réseaux comprenant des éléments électromécaniques ou électro-acoustiques; Résonateurs électromécaniques
15Détails de réalisation de résonateurs se composant de matériau piézo-électrique ou électrostrictif
17ayant un résonateur unique
CPC
C23C 14/06
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
06characterised by the coating material
C23C 14/0617
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
06characterised by the coating material
0617AIII BV compounds, where A is Al, Ga, In or Tl and B is N, P, As, Sb or Bi
H03H 9/02031
HELECTRICITY
03BASIC ELECTRONIC CIRCUITRY
HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
9Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
02Details
02007of bulk acoustic wave devices
02015Characteristics of piezoelectric layers, e.g. cutting angles
02031consisting of ceramic
H03H 9/02448
HELECTRICITY
03BASIC ELECTRONIC CIRCUITRY
HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
9Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
02Details
02244of microelectro-mechanical resonators
02433Means for compensation or elimination of undesired effects
02448of temperature influence
H03H 9/0595
HELECTRICITY
03BASIC ELECTRONIC CIRCUITRY
HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
9Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
02Details
05Holders; Supports
0595the holder support and resonator being formed in one body
H03H 9/2489
HELECTRICITY
03BASIC ELECTRONIC CIRCUITRY
HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
9Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
24Constructional features of resonators of material which is not piezo-electric, electrostrictive, or magnetostrictive
2405of microelectro-mechanical resonators
2468Tuning fork resonators
2478Single-Ended Tuning Fork resonators
2489with more than two fork tines
Déposants 株式会社村田製作所
Inventeurs 會田 康弘
梅田 圭一
Mandataires 稲葉 良幸
大貫 敏史
江口 昭彦
内藤 和彦
佐藤 睦
Données relatives à la priorité 2015001098 06.01.2015 JP
Titre
(JA) 圧電薄膜及び圧電振動子
Abrégé
(JA)

圧電特性を十分に確保しつつ応力を低減することができる圧電薄膜及び圧電振動子を提供する。
圧電薄膜は、AlN結晶と、AlN結晶においてAlと置き換えられる少なくとも1つの第1元素と、第1元素のイオン半径よりも小さく、かつ、Alのイオン半径よりも大きなイオン半径を有し、AlN結晶に添加される第2元素と、を含有する。

Également publié en tant que
CN201680004869.0