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1. DE112006003810 - Polierzusammensetzung für Siliciumwafer, Polierzusammensetzungskit für Siliciumwafer und Verfahren zum Siliciumwaferpolieren

Office
Allemagne
Numéro de la demande 112006003810
Date de la demande 18.10.2006
Numéro de publication 112006003810
Date de publication 15.01.2009
Type de publication T5
CIB
H01L 21/4
B24B 37/00
BTECHNIQUES INDUSTRIELLES; TRANSPORTS
24MEULAGE; POLISSAGE
BMACHINES, DISPOSITIFS OU PROCÉDÉS POUR MEULER OU POUR POLIR; DRESSAGE OU REMISE EN ÉTAT DES SURFACES ABRASIVES; ALIMENTATION DES MACHINES EN MATÉRIAUX DE MEULAGE, DE POLISSAGE OU DE RODAGE
37Machines ou dispositifs de rodage; Accessoires
C09K 3/4
CPC
C09G 1/02
CCHEMISTRY; METALLURGY
09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
GPOLISHING COMPOSITIONS
1Polishing compositions
02containing abrasives or grinding agents
C09K 3/1463
CCHEMISTRY; METALLURGY
09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
3Materials not provided for elsewhere
14Anti-slip materials; Abrasives
1454Abrasive powders, suspensions and pastes for polishing
1463Aqueous liquid suspensions
H01L 21/02024
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
02Manufacture or treatment of semiconductor devices or of parts thereof
02002Preparing wafers
02005Preparing bulk and homogeneous wafers
02008Multistep processes
0201Specific process step
02024Mirror polishing
Déposants DUPONT AIR PROD NANOMATERIALS
Inventeurs IWATA NAOYUKI
NAGASHIMA ISAO
Données relatives à la priorité 2006071503 15.03.2006 JP
2006320750 18.10.2006 JP
Titre
(DE) Polierzusammensetzung für Siliciumwafer, Polierzusammensetzungskit für Siliciumwafer und Verfahren zum Siliciumwaferpolieren
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