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1. DE000010104614 - Plasmaanlage und Verfahren zur Erzeugung einer Funktionsbeschichtung

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Office
Allemagne
Numéro de la demande 10104614
Date de la demande 02.02.2001
Numéro de publication 000010104614
Date de publication 22.08.2002
Type de publication A1
CIB
H01J 37/32
HÉLECTRICITÉ
01ÉLÉMENTS ÉLECTRIQUES FONDAMENTAUX
JTUBES À DÉCHARGE ÉLECTRIQUE OU LAMPES À DÉCHARGE ÉLECTRIQUE
37Tubes à décharge pourvus de moyens permettant l'introduction d'objets ou d'un matériau à exposer à la décharge, p.ex. pour y subir un examen ou un traitement
32Tubes à décharge en atmosphère gazeuse
H05H 1/3
CPC
C23C 16/513
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
16Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
44characterised by the method of coating
50using electric discharges
513using plasma jets
C23C 16/515
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
16Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
44characterised by the method of coating
50using electric discharges
515using pulsed discharges
H01J 37/32357
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
32Gas-filled discharge tubes, ; e.g. for surface treatment of objects such as coating, plating, etching, sterilising or bringing about chemical reactions
32009Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
32357Generation remote from the workpiece, e.g. down-stream
H01J 37/32706
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
32Gas-filled discharge tubes, ; e.g. for surface treatment of objects such as coating, plating, etching, sterilising or bringing about chemical reactions
32431Constructional details of the reactor
32697Electrostatic control
32706Polarising the substrate
H05H 1/30
HELECTRICITY
05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
HPLASMA TECHNIQUE
1Generating plasma; Handling plasma
24Generating plasma
26Plasma torches
30using applied electromagnetic fields, e.g. high frequency or microwave energy
Déposants BOSCH GMBH ROBERT
Inventeurs GROSSE STEFAN
HENKE SASCHA
SPINDLER SUSANNE
Titre
(DE) Plasmaanlage und Verfahren zur Erzeugung einer Funktionsbeschichtung
front page image
Abrégé
(DE)

Es wird eine Plasmaanlage mit einer induktiv gekoppelten Hochfrequenz-Plasmastrahlquelle (5) mit einem einen Plasmaerzeugungsraum (27) begrenzenden Brennerkörper (25) mit einer Austrittsöffnung (26) für den Plasmastrahl (20), einer den Plasmaerzeugungsraum (27) bereichsweise umgebenden Spule (17), einer Zuführung (10) zur Zufuhr eines Gases und/oder Precursor-Materials in den Plasmaerzeugungsraum (27) und einem mit der Spule (17) in Verbindung stehenden Hochfrequenzgenerator (16) zur Zündung des Plasmas (21) und Einkoppelung einer elektrischen Leistung in das Plasma (21) vorgeschlagen. Daneben weist die Plasmastrahlquelle (5) ein elektrisches Bauteil auf, mit dem die Intensität des Plasmastrahles (20) zeitlich periodisch veränderbar ist. Weiter ein Verfahren zur Erzeugung der Funktionsbeschichtung auf einem Substrat (19) mit der Plasmaanlage vorgeschlagen.


(EN)

A plasma unit with an inductively-coupled, high-frequency plasma beam source (5), comprising a burner body (25), defining a plasma generation chamber (27), an outlet opening (26) for the plasma beam (20), a coil (17) partly surrounding the plasma generation chamber (27), an inlet (10), for introduction of a gas or and/or precursor material into the plasma generation chamber (27) and a high frequency generator (16), connected to said coil (17), for initiating the plasma and injecting an electrical power into the plasma (21) is disclosed. The plasma beam source (5) further comprises an electrical component, by means of which the intensity of the plasma beam (20) may be intermittently altered in a periodic manner. The invention further relates to a method for the generation of a functional coating on a substrate (19) by means of the plasma unit.
Documents de brevet associés
EP1360880
US20110129617
JP2004518028
WO/2002/062114
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