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1. (WO2019042682) APPARATUS FOR AND METHOD CLEANING A SUPPORT INSIDE A LITHOGRAPHY APPARATUS
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WHAT IS CLAIMED IS:

1. Apparatus comprising a substrate configured to be supported by a first support structure, the substrate comprising at least one electrode configured to generate an electrostatic field between the at least one electrode and a confronting surface of a second support structure when the first support structure brings the surface of the substrate into spaced-apart apposition with the confronting surface of the second support structure and the at least one electrode is electrically connected to a voltage supply.

2. Apparatus as claimed in claim 1 wherein the first support structure is a wafer support.

3. Apparatus as claimed in claim 1 wherein the first support structure is a reticle support.

4. Apparatus as claimed in claim 1 wherein the second support structure comprises a chuck and a clamp supported by the chuck.

5. Apparatus as claimed in claim 1 wherein the voltage supply is part of the substrate.

6. Apparatus as claimed in claim 5 wherein the voltage supply is a battery and a voltage converter.

7. Apparatus as claimed in claim 1 wherein the substrate includes a switch for selectively connecting the electrode to the voltage supply.

8. Apparatus as claimed in claim 1 wherein the at least one electrode has a total area substantially the same as a total area of the confronting surface.

9. Apparatus as claimed in claim 1 wherein surface of the substrate in proximity to the confronting surface is substantially planar.

10. Apparatus as claimed in claim 1 wherein the confronting surface has a nonplanar surface

and the surface of the substrate in proximity to the confronting surface has a substantially complementary nonplanar surface.

11. Apparatus as claimed in claim 1 wherein the substrate has a layer comprises a material that is substantially nonconductive.

12. Apparatus as claimed in claim 1 wherein the substrate has a layer comprises a material that is substantially semiconductive.

13. Apparatus as claimed in claim 1 wherein the substrate has a layer of an adherent material on a surface of the substrate which confronts the confronting surface.

14. The apparatus of claim 13, wherein the adherent material is a polymeric material.

15. The apparatus of claim 14, wherein the polymeric material is polyimide or a fluoropolymer .

16. A lithographic apparatus comprising:

a chamber;

a positioning device configured and arranged to move an object placed on the positioning device into and out of the chamber;

a support structure positioned within the chamber;

a substrate placed on the positioning device and arranged such that the positioning device can move the substrate along a path including a first position in which the substrate is outside of the chamber and a second position in which a surface of the substrate is positioned adjacent a surface of the support structure, the substrate including at least one electrode; and

a voltage supply arranged to supply voltage to the at least one electrode when the substrate is in the second position.

17. Apparatus as claimed in claim 16 wherein the substrate comprises the voltage supply.

18. Apparatus as claimed in claim 16 wherein the voltage supply comprises a battery and a

voltage converter.

19. Apparatus as claimed in claim 16 wherein the voltage supply is external to the substrate and wherein the substrate further comprises at least one electrical contact arranged to be electrically connected to the voltage supply when the substrate is in the second position.

20. Apparatus as claimed in claim 16 further in which the substrate further comprises a switch arranged to selectively electrically connect the at least one electrode to the voltage supply.

21. Apparatus as claimed in claim 16 wherein the substrate has a layer of an adherent material on a surface of the substrate which confronts the support when the substrate is in the second position.

22. The apparatus of claim 21, wherein the adherent material is a polymeric material.

23. The apparatus of claim 22, wherein the polymeric material is polyimide or a fluoropolymer.

24. The apparatus of claim 16, wherein the substrate has a substantially planar surface.

25. The apparatus of claim 16, wherein the substrate has a surface comprising plurality of raised portions arranged to come into contact with the support when the substrate is in the second position.