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1. (WO2018086300) METHOD FOR FORMING SLANTING FACE AT SURFACE OF SUBSTRATE

Pub. No.:    WO/2018/086300    International Application No.:    PCT/CN2017/078831
Publication Date: Fri May 18 01:59:59 CEST 2018 International Filing Date: Fri Mar 31 01:59:59 CEST 2017
IPC: B81C 1/00
Applicants: SHANGHAI INDUSTRIAL ΜTECHNOLOGY RESEARCH INSTITUTE
上海新微技术研发中心有限公司
Inventors: DING, Liusheng
丁刘胜
Title: METHOD FOR FORMING SLANTING FACE AT SURFACE OF SUBSTRATE
Abstract:
A method for forming a slanting face at a surface of a substrate comprises: employing a size change of a material in an oxidization process to cause a flat face to slant with respect to a surface of a substrate (200), thereby forming a slanting face (208). An angle of the slanting face (208) is controllable. The slanting face (208) has favorable flatness.