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1. (WO2018026251) METHOD AND APPARATUS FOR CLEANING SEMICONDUCTOR WAFER

Pub. No.:    WO/2018/026251    International Application No.:    PCT/KR2017/008515
Publication Date: Fri Feb 09 00:59:59 CET 2018 International Filing Date: Tue Aug 08 01:59:59 CEST 2017
IPC: H01L 21/02
H01L 21/324
H01L 33/00
H01L 21/67
Applicants: MUJIN ELECTRONICS CO., LTD.
무진전자 주식회사
Inventors: LEE, Gil Gwang
이길광
YOON, Yong Hyeock
윤용혁
Title: METHOD AND APPARATUS FOR CLEANING SEMICONDUCTOR WAFER
Abstract:
The present disclosure relates to a method for cleaning a semiconductor wafer, comprising the steps of: preparing a wafer; dry-cleaning the wafer; and wet-cleaning the wafer, wherein the wafer is heated during the step of wet-cleaning the wafer.