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1. (WO2013113634) LITHOGRAPHIC APPARATUS COMPONENT AND LITHOGRAPHIC APPARATUS

Pub. No.:    WO/2013/113634    International Application No.:    PCT/EP2013/051480
Publication Date: Fri Aug 09 01:59:59 CEST 2013 International Filing Date: Sat Jan 26 00:59:59 CET 2013
IPC: G03F 7/20
Applicants: ASML NETHERLANDS B.V.
Inventors: KOEVOETS, Adrianus
DONDERS, Sjoerd
VAN SCHOOT, Jan
ZAAL, Koen
CADEE, Theodorus, Petrus, Maria
Title: LITHOGRAPHIC APPARATUS COMPONENT AND LITHOGRAPHIC APPARATUS
Abstract:
A lithographic apparatus component, such as a metrology system or an optical element (e.g., a mirror) is provided with a temperature control system for controlling deformation of the component. The control system includes channels provided close to a surface of the component through which a two phase cooling medium is supplied. The metrology system measures a position of at least a moveable item with respect to a reference position and includes a metrology frame connected to the reference position. An encoder is connected to the moveable item and constructed and arranged to measure a relative position of the encoder with respect to a reference grid. The reference grid may be provided directly on a surface of the metrology frame. A lithographic projection apparatus may have the metrology system for measuring a position of the substrate table with respect to the projection system.