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1. (WO2019066926) SPACER-PATTERNED INVERTERS BASED ON THIN-FILM TRANSISTORS
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Claims

What is claimed is:

1. A semiconductor device, comprising:

a substrate;

a first gate electrode and a second gate electrode above the substrate, wherein the first gate electrode and the second gate electrode are separated by a spacer;

a first channel area and a second channel area above the first gate electrode, wherein the first channel area includes a first type channel material, and the second channel area includes a second type channel material;

a third channel area and a fourth channel area above the second gate electrode, wherein the third channel area includes the first type channel material, and the fourth channel area includes the second type channel material, the third channel area is separated from the first channel area by the spacer;

a first source-drain contact coupled to a source area of the first channel area and a drain area of the second channel area, a second source-drain contact coupled to a source area of the third channel area and a drain area of the fourth channel area; and

a drain contact coupled to a drain area of the first channel area, a source contact coupled to a source area of the second channel area, a drain contact coupled to a drain area of the third channel area, and a source contact coupled to a source area of the fourth channel area.

2. The semiconductor device of claim 1, further comprising:

an interlay er dielectric (ILD) layer above the substrate and below the first gate electrode and the second gate electrode.

3. The semiconductor device of claim 1, further comprising:

a gate dielectric layer above the first gate electrode and the second gate electrode, and below the first channel area, the second channel area, the third channel area, and the fourth channel area, wherein the gate dielectric layer includes silicon and oxygen, silicon and nitrogen, yttrium and oxygen, silicon, oxygen, and nitrogen, aluminum and oxygen, hafnium and oxygen, tantalum and oxygen, or titanium and oxygen.

4. The semiconductor device of any one of claims 1-3, wherein the first type channel material is an n-type channel material and includes indium tin oxide (ITO), indium gallium zinc oxide (IGZO), indium zinc oxide (IZO), aluminum-doped zinc oxide (AZO), amorphous silicon, zinc oxide, amorphous germanium, polysilicon, poly germanium, or poly- III-V like

In As.

5. The semiconductor device of any one of claims 1-3, wherein the first type channel material is a p-type channel material and includes amorphous silicon, zinc oxide, amorphous germanium, polysilicon, poly germanium, poly- III-V like InAs, copper oxide (CuO), or tin oxide (SnO).

6. The semiconductor device of any one of claims 1-3, wherein the spacer includes silicon oxide (SiO), silicon nitride (SiN), 03-tetraethylorthosilicate (TEOS), Cb-hexamethyldisiloxane (HMDS), or plasma-TEOS oxide.

7. The semiconductor device of any one of claims 1-3, wherein the first gate electrode or the second gate electrode includes titanium (Ti), molybdenum (Mo), gold (Au), platinum (Pt), aluminum (Al), nickel (Ni), copper (Cu), chromium (Cr), or an alloy of Ti, Mo, Au, Pt, Al Ni, Cu, Cr, TiAIN, HfAIN, or InAlO.

8. The semiconductor device of any one of claims 1-3, wherein the substrate includes a silicon substrate, a glass substrate, a metal substrate, or a plastic substrate.

9. The semiconductor device of any one of claims 1-3, wherein the first gate electrode and the second gate electrode are above an interconnect, and the interconnect is above the substrate.

10. A computing device comprising:

a processor;

a memory device coupled to the processor, wherein the processor or the memory device includes a first inverter and a second inverter, and the first inverter and the second inverter include:

a substrate;

a first gate electrode and a second gate electrode above the substrate, wherein the first gate electrode and the second gate electrode are separated by a spacer;

a first channel area and a second channel area above the first gate electrode, wherein the first channel area includes a first type channel material, and the second channel area includes a second type channel material;

a third channel area and a fourth channel area above the second gate electrode,

wherein the third channel area includes the first type channel material, and the fourth channel area includes the second type channel material, the third channel area is separated from the first channel area by the spacer;

a first source-drain contact coupled to a source area of the first channel area and a drain area of the second channel area, a second source-drain contact coupled to a source area of the third channel area and a drain area of the fourth channel area, wherein:

the first inverter includes the first gate electrode, the first channel area, the second channel area, and the first source-drain contact coupled to the source area of the first channel area and the drain area of the second channel area; and

the second inverter includes the second gate electrode, the third channel area, the fourth channel area, and the second source-drain contact coupled to the source area of the third channel area and the drain area of the fourth channel area.

11. The computing device of claim 10, further comprising:

an interlay er dielectric (ILD) layer above the substrate and below the first gate electrode and the second gate electrode.

12. The computing device of claim 10, further comprising:

a gate dielectric layer above the first gate electrode and the second gate electrode, and below the first channel area, the second channel area, the third channel area, and the fourth channel area, wherein the gate dielectric layer includes silicon and oxygen, silicon and nitrogen, yttrium and oxygen, silicon, oxygen, and nitrogen, aluminum and oxygen, hafnium and oxygen, tantalum and oxygen, or titanium and oxygen.

13. The computing device of any one of claims 10-12, wherein the first type channel material is an n-type channel material and includes indium tin oxide (ITO), indium gallium zinc oxide (IGZO), indium zinc oxide (IZO), aluminum-doped zinc oxide (AZO), amorphous silicon, zinc oxide, amorphous germanium, polysilicon, poly germanium, or poly- III-V like

In As.

14. The computing device of any one of claims 10-12, wherein the first type channel material is a p-type channel material and includes amorphous silicon, zinc oxide, amorphous germanium, polysilicon, poly germanium, poly- III-V like InAs, copper oxide (CuO), or tin oxide (SnO).

15. The computing device of any one of claims 10-12, wherein the first gate electrode or the second gate electrode includes titanium (Ti), molybdenum (Mo), gold (Au), platinum (Pt), aluminum (Al), nickel (Ni), copper (Cu), chromium (Cr), or an alloy of Ti, Mo, Au, Pt, Al Ni, Cu, Cr, TiAIN, HfAIN, or InAlO.

16. The semiconductor device of any one of claims 10-12, wherein the spacer includes silicon oxide (SiO), silicon nitride (SiN), 03-tetraethylorthosilicate (TEOS), O3-hexamethyldisiloxane (HMDS), or plasma-TEOS oxide.

17. The computing device of any one of claims 10-12, wherein the computing device is a wearable device or a mobile computing device, the wearable device or the mobile computing device including one or more of an antenna, a touchscreen controller, a battery, an audio codec, a video codec, a power amplifier, a global positioning system (GPS) device, a compass, a Geiger counter, an accelerometer, a gyroscope, a speaker, or a camera coupled with the circuit board.

18. A method for forming a semiconductor device, the method comprising:

forming a backbone area above a gate electrode, wherein the gate electrode is above a substrate;

forming a continuous fin of a first type conformally covering the backbone area, wherein the continuous fin of the first type includes a first type channel material;

forming an oxide area conformally covering the continuous fin of the first type;

forming a continuous fin of a second type conformally covering the oxide area, wherein the continuous fin of the second type includes a second type channel material;

removing a top part of the continuous fin of the second type, a top part of the oxide area, a top part of the continuous fin of the first type, to expose the backbone area, wherein the continuous fin of the first type becomes a first fin of the first type and a second fin of the first type disconnected from each other, and the continuous fin of the second type becomes a first fin of the second type and a second fin of the second type disconnected from each other;

removing the backbone area and a part of the gate electrode to have a gap, wherein the gate electrode becomes a first gate electrode and a second gate electrode disconnected from each other; and

filling the gap by a dielectric material to form a spacer.

19. The method of claim 18, further comprising:

forming a first source-drain contact coupled to a source area of the first fin of the first type and a drain area of the first fin of the second type, a second source-drain contact coupled to a source area of the second fin of the first type and a drain area of the second fin of the second type; and

forming a drain contact coupled to a drain area of the first fin of the first type, a source contact coupled to a source area of the first fin of the second type, a drain contact coupled to a drain area of the second fin of the first type, and a source contact coupled to a source area of the second fin of the second type.

20. The method of claim 18, further comprising:

forming a gate dielectric layer above the gate electrode before forming the backbone area, wherein the removing the backbone area and the part of the gate electrode further includes removing a part of the gate dielectric layer to have the gap, the gate electrode becomes the first gate electrode and the second gate electrode, and the gate dielectric layer includes silicon and oxygen, silicon and nitrogen, yttrium and oxygen, silicon, oxygen, and nitrogen, aluminum and oxygen, hafnium and oxygen, tantalum and oxygen, or titanium and oxygen.

21. The method of any one of claims 18-20, wherein the first type channel material is an n-type material and includes indium tin oxide (ITO), indium gallium zinc oxide (IGZO), indium zinc oxide (IZO), aluminum-doped zinc oxide (AZO), amorphous silicon, zinc oxide, amorphous germanium, polysilicon, poly germanium, or poly- III-V like InAs.

22. The method of any one of claims 18-20, wherein the first type channel material is a p-type material and includes amorphous silicon, zinc oxide, amorphous germanium, polysilicon, poly germanium, poly- III-V like InAs, copper oxide (CuO), or tin oxide (SnO).

23. The method of any one of claims 18-20, wherein the spacer includes silicon oxide (SiO), silicon nitride (SiN), 03-tetraethylorthosilicate (TEOS), 03-hexamethyldisiloxane (HMDS), or plasma-TEOS oxide.

24. The method of any one of claims 18-20, wherein the first gate electrode or the second gate electrode includes titanium (Ti), molybdenum (Mo), gold (Au), platinum (Pt), aluminum (Al), nickel (Ni), copper (Cu), chromium (Cr), or an alloy of Ti, Mo, Au, Pt, Al Ni, Cu, Cr, TiAIN, HfAlN, or InAlO.

25. The method of any one of claims 18-20, wherein the substrate includes a silicon

substrate, a glass substrate, a metal substrate, or a plastic substrate.