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1. (WO2019046141) TRAINING A LEARNING BASED DEFECT CLASSIFIER
국제사무국에 기록된 최신 서지정보    정보 제출

공개번호: WO/2019/046141 국제출원번호: PCT/US2018/048042
공개일: 07.03.2019 국제출원일: 27.08.2018
IPC:
H01L 21/66 (2006.01)
H SECTION H — 전기
01
기본적 전기소자
L
반도체 장치; 다른 곳에 속하지 않는 전기적 고체 장치
21
반도체 장치 또는 고체 장치 또는 그러한 부품의 제조 또는 처리에 특별히 적용되는 방법 또는 장비
66
제조 또는 처리중의 시험이나 측정
출원인:
KLA-TENCOR CORPORATION [US/US]; Legal Department One Technology Drive Milpitas, California 95035, US
발명자:
BRAUER, Bjorn; US
대리인:
MCANDREWS, Kevin; US
MORRIS, Elizabeth M. N; US
우선권 정보:
16/109,63122.08.2018US
62/553,35101.09.2017US
발명의 명칭: (EN) TRAINING A LEARNING BASED DEFECT CLASSIFIER
(FR) FORMATION D'UN CLASSIFICATEUR DE DÉFAUTS BASÉ SUR L'APPRENTISSAGE
요약서:
(EN) Methods and systems for training a learning based defect classifier are provided. One method includes training a learning based defect classifier with a training set of defects that includes identified defects of interest (DOIs) and identified nuisances. The DOIs and nuisances in the training set include DOIs and nuisances identified on at least one training wafer and at least one inspection wafer. The at least one training wafer is known to have an abnormally high defectivity and the at least one inspection wafer is expected to have normal defectivity.
(FR) La présente invention concerne des procédés et des systèmes pour la formation d'un classificateur de défauts basé sur l'apprentissage. Un procédé comprend la formation d'un classificateur de défauts basé sur l'apprentissage avec un ensemble de formation de défauts qui comprend des défauts d'intérêt (DOI) identifiés et des nuisances identifiées. Les DOI et les nuisances dans l'ensemble de formation comprennent des DOI et des nuisances identifiés sur au moins une plaquette de formation et au moins une tranche d'inspection. L'une ou les plaquettes de formation sont connues pour avoir une défectivité anormalement élevée et l'une ou les plaquettes d'inspection sont censées avoir une défectivité normale.
front page image
지정국: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
아프리카지역 지식재산권기구(ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
유라시아 특허청 (AM, AZ, BY, KG, KZ, RU, TJ, TM)
유럽 특허청(EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
공개언어: 영어 (EN)
출원언어: 영어 (EN)