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1. (WO2019025036) OPTICAL SYSTEM FOR MICROLITHOGRAPHY
국제사무국에 기록된 최신 서지정보    정보 제출

공개번호: WO/2019/025036 국제출원번호: PCT/EP2018/057865
공개일: 07.02.2019 국제출원일: 28.03.2018
IPC:
G03F 7/20 (2006.01)
G SECTION G — 물리학
03
전자사진; 광파 이외의 파를 사용하는 유사기술; 영화; 사진; 홀로그래피(Holography)
F
사진제판법에 의한 요철화 또는 패턴화 표면의 제조, 예. 인쇄용, 반도체장치의 제조법용; 그것을 위한 재료; 그것을 위한 원료; 그것을 위한 특별히 적합한 장치
7
사진제판법, 예 사진석판법에 의한 요철화 또는 패턴화된 표면의 제조, 예. 인쇄표면의 제조 그것을 위한 재료, 예. 포토레지스트로 된 것 그것을 위하여 특히 적합한 장치
20
노광; 그것을 위한 장치
출원인:
GROSSMANN, Jan [DE/DE]; DE (US)
CARL ZEISS SMT GMBH [DE/DE]; Rudolf-Eber-Strasse 2 73447 Oberkochen, DE (AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BE, BF, BG, BH, BJ, BN, BR, BW, BY, BZ, CA, CF, CG, CH, CI, CL, CM, CN, CO, CR, CU, CY, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, FR, GA, GB, GD, GE, GH, GM, GN, GQ, GR, GT, GW, HN, HR, HU, ID, IE, IL, IN, IR, IS, IT, JO, JP, KE, KG, KH, KM, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LT, LU, LV, LY, MA, MC, MD, ME, MG, MK, ML, MN, MR, MT, MW, MX, MY, MZ, NA, NE, NG, NI, NL, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SI, SK, SL, SM, SN, ST, SV, SY, SZ, TD, TG, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, UZ, VC, VN, ZA, ZM, ZW)
발명자:
GROSSMANN, Jan; DE
대리인:
FRANK, Hartmut; DE
우선권 정보:
10 2017 213 121.731.07.2017DE
발명의 명칭: (EN) OPTICAL SYSTEM FOR MICROLITHOGRAPHY
(FR) SYSTÈME OPTIQUE POUR LA MICROLITHOGRAPHIE
(DE) OPTISCHES SYSTEM FÜR DIE MIKROLITHOGRAPHIE
요약서:
(EN) The invention relates to an optical system for microlithography, the optical system being designed for operation with electromagnetic radiation, which passes through the optical system along a useful beam path, having at least one component (105) which has a region situated outside the useful beam path, said region having a catalytically or chemically active layer (110), and the catalytically or chemically active layer (110) and/or a substrate (230, 240) supporting said layer (110) being porous.
(FR) L'invention concerne un système optique pour la microlithographie, le système optique étant conçu pour un fonctionnement par rayonnement électromagnétique, ledit système optique parcourt un trajet optique utile, comprenant au moins un élément (105) qui présente une zone se trouvant hors du trajet optique utile, cette zone présentant une couche catalytiquement ou chimiquement active (110), et la couche catalytiquement ou chimiquement active (1 10) et/ou un support (230, 240) portant cette couche (110) étant poreux.
(DE) Die Erfindung betrifft ein optisches System für die Mikrolithographie, wobei das optische System für einen Betrieb mit elektromagnetischer Strahlung ausgelegt ist, welche das optische System entlang eines Nutzstrahlengangs durchläuft, mit wenigstens einer Komponente (105), welche einen außerhalb des Nutzstrahlengangs befindlichen Bereich aufweist, wobei dieser Bereich eine katalytische oder chemisch aktive Schicht (110) aufweist, und wobei die katalytische oder chemisch aktive Schicht (110) und/oder ein diese Schicht (110) tragender Träger (230, 240) porös ist.
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지정국: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
아프리카지역 지식재산권기구(ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
유라시아 특허청 (AM, AZ, BY, KG, KZ, RU, TJ, TM)
유럽 특허청(EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
공개언어: 독일어 (DE)
출원언어: 독일어 (DE)