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1. (WO2008000571) METHOD OF PRODUCING A DETACHABLE, ANTI-FOULING COATING
국제사무국에 기록된 최신 서지정보   

공개번호:    WO/2008/000571    국제출원번호:    PCT/EP2007/055207
공개일: 03.01.2008 국제출원일: 29.05.2007
IPC:
B05D 5/08 (2006.01), B08B 17/04 (2006.01), B08B 17/06 (2006.01), C08K 3/36 (2006.01), C09D 5/16 (2006.01), C09D 7/12 (2006.01), C09D 183/04 (2006.01)
출원인: EVONIK DEGUSSA GMBH [DE/DE]; Rellinghauser Str. 1-11, 45128 Essen (DE) (For All Designated States Except US).
MICHEL, Werner [DE/DE]; (DE) (For US Only).
MUELLER, Felix [DE/DE]; (DE) (For US Only)
발명자: MICHEL, Werner; (DE).
MUELLER, Felix; (DE)
일반
대표자:
EVONIK DEGUSSA GMBH; Dg-ipm-pat, Postcode 84/339, Rodenbacher Chaussee 4, 63457 Hanau (DE)
우선권 정보:
10 2006 030 055.6 29.06.2006 DE
발명의 명칭: (EN) METHOD OF PRODUCING A DETACHABLE, ANTI-FOULING COATING
(FR) PROCÉDÉ DE PRODUCTION D'UN REVÊTEMENT ANTITACHE DÉTACHABLE
요약서: front page image
(EN)Disclosed is a method of producing a detachable, anti-fouling coating on an article, wherein a preparation comprising nanoscale hydrophobic particles and at least one volatile siloxane is applied to at least one surface of an article and then the volatile siloxane is removed.
(FR)La présente invention concerne un procédé de production d'un revêtement antitache détachable sur un article. Ledit procédé consiste à appliquer une préparation, contenant des nanoparticules hydrophobes et au moins un siloxane volatil, sur une surface au moins d'un article, puis à retirer le siloxane volatil.
지정국: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, SV, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, LV, MC, MT, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
공개언어: English (EN)
출원언어: English (EN)