국제 및 국내 특허문헌 검색

1. (WO2006017163) VERSATILE SEMI-TOROIDAL PROCESSING FURNACE WITH AUTOMATIC AND RECONFIGURABLE WAFER EXCHANGE

Pub. No.:    WO/2006/017163    International Application No.:    PCT/US2005/024237
Publication Date: Fri Feb 17 00:59:59 CET 2006 International Filing Date: Sun Jul 10 01:59:59 CEST 2005
IPC: F26B 19/00
F27D 11/00
Applicants: DIAMOND SEMICONDUCTOR, INC.
BAYNE, Christopher, J.
Inventors: BAYNE, Christopher, J.
Title: VERSATILE SEMI-TOROIDAL PROCESSING FURNACE WITH AUTOMATIC AND RECONFIGURABLE WAFER EXCHANGE
Abstract:
The present invention comprises a fully automated, fabrication compliant furnace with the advantages of the horizontal most of the advantages of the vertical furnace. One embodiment of the present invention is that it implements a multi-degree motion robot arm to move wafers from a loading area to a WIP station where the wafer are then loaded into wafer boats on a rotating cantilever system or directly onto a specialized and reconfigurable paddle designed to hold wafers: The wafers may be loaded in the horizontal processing position as well as the vertical processing position. Multiple levels of the semi-toroidal horizontal processors allow for multiple batches of wafers to be loaded, processed, cooled, and unloaded by the robot arm. The present invention reduces the footprint of the traditional horizontal or vertical furnaces, increases capacity and throughput, and allows for direct tube transfer.