국제 및 국내 특허문헌 검색
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1. (WO1997018158) MANUFACTURE OF VERY LOW ARSENIC HYDROGEN FLUORIDE
국제사무국에 기록된 최신 서지정보

공개번호: WO/1997/018158 국제출원번호: PCT/US1996/017924
공개일: 22.05.1997 국제출원일: 08.11.1996
국제예비심사 청구일: 16.04.1997
IPC:
C01B 7/19 (2006.01)
C SECTION C — 화학; 야금
01
무기화학
B
비금속 원소; 그 화합물
7
할로겐; 할로겐산
19
플루오르; 플루오르화수소
출원인:
ALLIEDSIGNAL INC. [US/US]; 101 Columbia Road P.O Box 2245 Morristown, NJ 07962-2245, US
발명자:
KUNKEL, Paul, Frederick; US
REDMON, Charles, Lewis; US
SUBBANNA, Somanahalli, Naranappa; US
대리인:
CRISS, Roger, H.; AlliedSignal Inc. Law Dept. (C.A. McNally) 101 Columbia Road P.O. Box 2245 Morristown, NJ 07962-2245, US
GIANNESCHI, Lois; AlliedSignal Inc. (Law Department, Attn.: C.A. McNally) 101 Columbia Road P.O. Box 2245 Morristown, NJ 07962-2245, US
우선권 정보:
08/555,65913.11.1995US
발명의 명칭: (EN) MANUFACTURE OF VERY LOW ARSENIC HYDROGEN FLUORIDE
(FR) PRODUCTION DE FLUORURE D'HYDROGENE A TRES FAIBLE TENEUR EN ARSENIC
요약서:
(EN) The invention provides a process for the preparation of hydrogen fluoride having a very low arsenic level. More specifically, the invention provides a process in which industrial grade anhydrous hydrogen fluoride, or an intermediate product obtained during the hydrogen fluoride manufacturing process, is contacted with an oxidizer in order to oxidize the arsenic impurity to produce anhydrous hydrogen fluoride with a level of arsenic impurity that is at least less than two parts per billion, or aqueous hydrogen fluoride with a correspondingly low level of arsenic.
(FR) L'invention se rapporte à un procédé de préparation de fluorure d'hydrogène à très faible teneur en arsenic. L'invention se rapporte plus spécifiquement à un procédé dans lequel le fluorure d'hydrogène anhydre de qualité industrielle, ou un produit intermédiaire obtenu au cours du processus de production du fluorure d'hydrogène, est mis en contact avec un agent d'oxydation afin d'oxyder les impuretés d'arsenic et d'obtenir un fluorure d'hydrogène anhydre dont le taux d'arsenic est au moins inférieur à deux parts par milliard, ou un fluorure d'hydrogène aqueux dont le taux d'arsenic est proportionnellement faible.
지정국: AL, AU, BB, BG, BR, CA, CN, CU, CZ, EE, GE, IL, IS, JP, KP, KR, LK, LR, LS, LT, LV, MG, MK, MN, MW, MX, NZ, PL, RO, RU, SD, SG, SI, SK, TR, TT, UA, VN
아프리카지역 지식재산권기구(ARIPO) (KE, LS, MW, SD, SZ, UG)
유라시아 특허청(EAPO) (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
유럽 특허청(EPO) (AT, BE, CH, DE, DK, ES, FI, FR, GB, GR, IE, IT, LU, MC, NL, PT, SE)
아프리카 지식재산권기구(OAPI) (BF, BJ, CF, CG, CI, CM, GA, GN, ML, MR, NE, SN, TD, TG)
공개언어: 영어 (EN)
출원언어: 영어 (EN)
또한로 출판 됨:
MXPA/a/1998/003559SG53590EP0879211AU1996076107