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1. (WO2006037388) APPARATUS AND METHOD FOR REDUCING THE SECTION AND SIZING OF ROLLING MILL PRODUCTS FOR WIRE ROD
국제사무국에 기록된 최신 서지정보   

공개번호:    WO/2006/037388    국제출원번호:    PCT/EP2005/007866
공개일: 13.04.2006 국제출원일: 18.07.2005
국제예비심사 청구일:    20.04.2006    
IPC:
B21B 1/18 (2006.01)
출원인: SIEMENS VAI METALS TECHNOLOGIES S.R.L. [IT/IT]; Via L. Da Vinci 20, I-21053 Castellanza (IT) (For All Designated States Except US).
FERRARIO, Giuseppe [IT/IT]; (IT) (For US Only)
발명자: FERRARIO, Giuseppe; (IT)
대리인: MARTEGANI, Franco; Franco Martegani S.r.l., Via Carlo Alberto 41, I-20052 Monza (IT)
우선권 정보:
MI2004A001897 06.10.2004 IT
발명의 명칭: (EN) APPARATUS AND METHOD FOR REDUCING THE SECTION AND SIZING OF ROLLING MILL PRODUCTS FOR WIRE ROD
(FR) APPAREIL ET PROCEDE POUR REDUIRE LA SECTION ET LA TAILLE DES PRODUITS DE LAMINAGE POUR FIL MACHINE
요약서: front page image
(EN)An apparatus for reducing the section and sizing of rolling mill products for wire rod comprises a first finishing monoblock (10) made up of a plurality of rolling stands (Gl-Gn) arranged in sequence suitable for forming a rolling line and a second monoblock (20) suitable for giving the product a round section with narrow tolerances. According to the invention, said second monoblock (20) comprises a sequence of stands (Sl-S4) of the type with grooves configured so as to give a round-oval-round-round section to the product.
(FR)Cette invention concerne un appareil servant à réduire la section et la taille des produits de laminage pour un fil machine et comprenant à cet effet un premier monobloc de finissage (10) constitué de plusieurs cages (G1-Gn) disposées en séquence et conçues pour former une ligne de laminage, et un second monobloc (20) conçu pour donner au produit une section ronde avec des tolérances étroites. Selon cette invention, ce second monobloc (20) comprend une séquence de cages (S1-S4) du type avec rainures configurées pour donner au produit une section ronde-oval-ronde-ronde.
지정국: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RU, SC, SD, SE, SG, SK, SL, SM, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, YU, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, LV, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
공개언어: English (EN)
출원언어: English (EN)