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1. WO2018203524 - 基板収納容器

公開番号 WO/2018/203524
公開日 08.11.2018
国際出願番号 PCT/JP2018/017191
国際出願日 27.04.2018
予備審査請求日 28.09.2018
IPC
H01L 21/673 2006.01
H電気
01基本的電気素子
L半導体装置,他に属さない電気的固体装置
21半導体装置または固体装置またはそれらの部品の製造または処理に特に適用される方法または装置
67製造または処理中の半導体または電気的固体装置の取扱いに特に適用される装置;半導体または電気的固体装置もしくは構成部品の製造または処理中のウエハの取扱いに特に適用される装置
673特に適合するキャリアを使用するもの
CPC
G05D 7/0186
GPHYSICS
05CONTROLLING; REGULATING
DSYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
7Control of flow
01without auxiliary power
0186without moving parts
H01L 21/67028
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; ; Apparatus not specifically provided for elsewhere
67005Apparatus not specifically provided for elsewhere
67011Apparatus for manufacture or treatment
67017Apparatus for fluid treatment
67028for cleaning followed by drying, rinsing, stripping, blasting or the like
H01L 21/67373
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; ; Apparatus not specifically provided for elsewhere
673using specially adapted carriers ; or holders; Fixing the workpieces on such carriers or holders
6735Closed carriers
67373characterised by locking systems
H01L 21/67376
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; ; Apparatus not specifically provided for elsewhere
673using specially adapted carriers ; or holders; Fixing the workpieces on such carriers or holders
6735Closed carriers
67376characterised by sealing arrangements
H01L 21/67379
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; ; Apparatus not specifically provided for elsewhere
673using specially adapted carriers ; or holders; Fixing the workpieces on such carriers or holders
6735Closed carriers
67379characterised by coupling elements, kinematic members, handles or elements to be externally gripped
H01L 21/67389
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; ; Apparatus not specifically provided for elsewhere
673using specially adapted carriers ; or holders; Fixing the workpieces on such carriers or holders
6735Closed carriers
67389characterised by atmosphere control
出願人
  • ミライアル株式会社 MIRAIAL CO., LTD. [JP]/[JP]
発明者
  • 松鳥 千明 MATSUTORI Chiaki
代理人
  • 正林 真之 SHOBAYASHI Masayuki
  • 林 一好 HAYASHI Kazuyoshi
  • 岩池 満 IWAIKE Mitsuru
優先権情報
PCT/JP2017/01724402.05.2017JP
公開言語 (言語コード) 日本語 (JA)
出願言語 (言語コード) 日本語 (JA)
指定国 (国コード)
発明の名称
(EN) SUBSTRATE STORAGE CONTAINER
(FR) RÉCIPIENT DE STOCKAGE DE SUBSTRAT
(JA) 基板収納容器
要約
(EN)
This substrate storage container is provided with: a container body 2; a lid body which can be attached to and detached from an opening portion of the container body and which can close the opening portion of the container body; a gas flow path 210 which can connect a substrate storage space 27 and a space outside the container body 2; and a gas jetting nozzle part 8 having a plurality of opening portions 802 through which a gas having flowed in the gas flow path 210 is supplied to the substrate storage space 27, wherein a gas-flow-rate uniformizing unit that allows outflow of the gas from the plurality of opening portions 802 at a uniformized flow rate, is included.
(FR)
L'invention concerne un récipient de stockage de substrat comprenant : un corps de récipient 2; un corps de couvercle qui peut être fixé à une partie d'ouverture du corps de récipient et détaché de celle-ci et qui peut fermer la partie d'ouverture du corps de récipient; un trajet d'écoulement de gaz 210 qui peut relier un espace de stockage de substrat 27 et un espace à l'extérieur du corps de récipient 2; et une partie de buse d'éjection de gaz 8 ayant une pluralité de parties d'ouverture 802 à travers lesquelles un gaz ayant circulé dans le trajet d'écoulement de gaz 210 est fourni à l'espace de stockage de substrat 27, une unité d'uniformisation de débit de gaz qui permet l'écoulement du gaz à partir de la pluralité de parties d'ouverture 802 à un débit uniformisé est incluse.
(JA)
基板収納容器は、容器本体2と、容器本体開口部に対して着脱可能であり、容器本体開口部を閉塞可能な蓋体と、基板収納空間27と容器本体2の外部の空間とを連通可能な通気路210と、通気路210に流入した気体を基板収納空間27に供給する複数の開口部802を有する気体噴出ノズル部8と、を備え、複数の開口部802から均一化された流量で気体を流出可能とする気体流量均一化部を有する基板収納容器である。
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