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1. (WO2018044240) A METHOD OF FORMING NANO-PATTERNS ON A SUBSTRATE

Pub. No.:    WO/2018/044240    International Application No.:    PCT/SG2017/050440
Publication Date: Fri Mar 09 00:59:59 CET 2018 International Filing Date: Wed Sep 06 01:59:59 CEST 2017
IPC: B82Y 40/00
G02B 1/118
Applicants: AGENCY FOR SCIENCE, TECHNOLOGY AND RESEARCH
Inventors: YANG, Kwang Wei Joel
DONG, Zhaogang
PANIAGUA-DOMINGUEZ, Ramón
KUZNETSOV, Arseniy
YU, Yefeng
Title: A METHOD OF FORMING NANO-PATTERNS ON A SUBSTRATE
Abstract:
This application relates to a method of forming nano-patterns on a substrate comprising the step of forming a plurality of nanostructures on a dielectric substrate, wherein the nanostructures are dimensioned or spaced apart from each other by a scaling factor of the dielectric substrate with reference to a silicon substrate. There is also provided a method of forming a nano-patterned substrate comprising the step of forming a plurality of nanostructures on a dielectric substrate, wherein said dielectric substrate comprises an anti-reflectance layer disposed on a base substrate. There is also provided a method of forming a nano-patterned substrate comprising the steps of forming a plurality of nanostructures on a dielectric substrate, wherein the dielectric substrate comprises an anti-reflectance layer disposed on a base substrate, wherein the nanostructures comprise a dielectric material, and wherein the nanostructures are dimensioned or spaced apart from each other by a scaling factor of the dielectric material with reference to a silicon substrate.