処理中

しばらくお待ちください...

設定

設定

出願の表示

1. WO2012008218 - 塗布膜製造用加熱乾燥装置およびこれを備えた塗布膜製造装置ならびに塗布膜製造方法

公開番号 WO/2012/008218
公開日 19.01.2012
国際出願番号 PCT/JP2011/061503
国際出願日 19.05.2011
IPC
F26B 15/12 2006.01
F機械工学;照明;加熱;武器;爆破
26乾燥
B固体材料または固形物から液体を除去することによる乾燥
15前送り運動を伴う物体を乾燥するための機械または装置;前送り運動を伴うひとかたまりの材料を乾燥するための機械または装置
101またはそれ以上の直線,例.複合,からなる通路における運動を伴うもの
12その線が全部水平かまたはわずかに傾斜しているもの
B05C 9/14 2006.01
B処理操作;運輸
05霧化または噴霧一般;液体または他の流動性材料の表面への適用一般
C液体または他の流動性材料を表面に適用する装置一般
9グループB05C1/00~B05C7/00に包含されない手段によって表面に液体もしくは他の流動性材料を適用する装置または設備,または液体もしくは他の流動性材料を適用する手段が重要でないような装置もしくは設備
08液体または他の流動性材料を適用しかつ補助操作を行なうためのもの
14補助操作に加熱作用を含むもの
CPC
F26B 15/12
FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
26DRYING
BDRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
15Machines or apparatus for drying objects with progressive movement; Machines or apparatus with progressive movement for drying batches of material in compact form
10with movement in a path composed of one or more straight lines, e.g. compound ; , the movement being in alternate horizontal and vertical directions
12the lines being all horizontal or slightly inclined
F26B 3/283
FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
26DRYING
BDRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
3Drying solid materials or objects by processes involving the application of heat
28by radiation, e.g. from the sun
283in combination with convection
H01L 21/67109
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; ; Apparatus not specifically provided for elsewhere
67005Apparatus not specifically provided for elsewhere
67011Apparatus for manufacture or treatment
67098Apparatus for thermal treatment
67109mainly by convection
H01L 21/6715
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; ; Apparatus not specifically provided for elsewhere
67005Apparatus not specifically provided for elsewhere
67011Apparatus for manufacture or treatment
6715Apparatus for applying a liquid, a resin, an ink or the like
H01L 21/67706
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; ; Apparatus not specifically provided for elsewhere
677for conveying, e.g. between different workstations
67703between different workstations
67706Mechanical details, e.g. roller, belt
H01L 21/6776
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; ; Apparatus not specifically provided for elsewhere
677for conveying, e.g. between different workstations
67739into and out of processing chamber
6776Continuous loading and unloading into and out of a processing chamber, e.g. transporting belts within processing chambers
出願人
  • シャープ株式会社 SHARP KABUSHIKI KAISHA [JP]/[JP] (AllExceptUS)
  • 塩崎 唯史 SHIOZAKI, Tadashi (UsOnly)
  • 神徳 千幸 KOHTOKU, Yukihide (UsOnly)
発明者
  • 塩崎 唯史 SHIOZAKI, Tadashi
  • 神徳 千幸 KOHTOKU, Yukihide
代理人
  • 特許業務法人深見特許事務所 Fukami Patent Office, p.c.
優先権情報
2010-15783312.07.2010JP
公開言語 (言語コード) 日本語 (JA)
出願言語 (言語コード) 日本語 (JA)
指定国 (国コード)
発明の名称
(EN) HEATING/DRYING APPARATUS FOR MANUFACTURING FILM, FILM MANUFACTURING APPARATUS PROVIDED WITH THE HEATING/DRYING APPARATUS, AND FILM MANUFACTURING METHOD
(FR) APPAREIL DE CHAUFFAGE/SÉCHAGE POUR FABRIQUER UN FILM, APPAREIL DE FABRICATION DE FILM COMPORTANT L'APPAREIL DE CHAUFFAGE/SÉCHAGE, ET PROCÉDÉ DE FABRICATION DE FILM
(JA) 塗布膜製造用加熱乾燥装置およびこれを備えた塗布膜製造装置ならびに塗布膜製造方法
要約
(EN)
A heating/drying apparatus (10A) is provided with: a transfer roller (12) that transfers a substrate (100), while maintaining the attitude of the substrate in such a manner that the upper surface thereof faces upward in the perpendicular direction, said substrate having a solution containing a film material applied on the upper surface thereof; and a heating source (21), which dries the solution applied on the upper surface of the substrate (100) by applying heat to the solution, said substrate being transferred on a transfer path (8) defined by the transfer roller (12).
(FR)
L'invention porte sur un appareil de chauffage/séchage (10A), qui comporte : un rouleau de transfert (12) qui transfère un substrat (100), tout en maintenant l'orientation du substrat de telle manière que sa surface supérieure est dirigée vers le haut dans la direction perpendiculaire, ledit substrat ayant une solution contenant un matériau de film appliqué sur sa surface supérieure; et une source de chauffage (21), qui sèche la solution appliquée sur la surface supérieure du substrat (100) par application de la chaleur à la solution, ledit substrat étant transféré sur une trajectoire de transfert (8) définie par le rouleau de transfert (12).
(JA)
 加熱乾燥装置(10A)は、塗布膜材料を含む溶液が上面に塗布されている基板(100)を当該上面が鉛直上方を向いた姿勢を維持しつつ搬送する搬送ローラ(12)と、搬送ローラ(12)によって規定される搬送路(8)上を移動している基板(100)の上面に塗布されている溶液に対して熱を付与することにより、当該溶液の乾燥処理を行なう加熱源(21)とを備える。
国際事務局に記録されている最新の書誌情報