処理中

しばらくお待ちください...

設定

設定

1. WO2007105567 - カラーフィルタおよびその製造に用いるフォトマスク

公開番号 WO/2007/105567
公開日 20.09.2007
国際出願番号 PCT/JP2007/054457
国際出願日 07.03.2007
IPC
G02B 5/20 2006.01
G物理学
02光学
B光学要素,光学系,または光学装置
5レンズ以外の光学要素
20フィルター
G02F 1/1335 2006.01
G物理学
02光学
F光の強度,色,位相,偏光または方向の制御,例.スイッチング,ゲーテイング,変調または復調のための装置または配置の媒体の光学的性質の変化により,光学的作用が変化する装置または配置;そのための技法または手順;周波数変換;非線形光学;光学的論理素子;光学的アナログ/デジタル変換器
1独立の光源から到達する光の強度,色,位相,偏光または方向の制御のための装置または配置,例.スィッチング,ゲーテイングまたは変調;非線形光学
01強度,位相,偏光または色の制御のためのもの
13液晶に基づいたもの,例.単一の液晶表示セル
133構造配置;液晶セルの作動;回路配置
1333構造配置
1335セルと光学部材,例.偏光子または反射鏡,との構造的組合せ
CPC
G02B 5/201
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
5Optical elements other than lenses
20Filters
201in the form of arrays
G02F 1/133512
GPHYSICS
02OPTICS
FDEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH IS MODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THE DEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY, COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g. SWITCHING, GATING, MODULATING OR DEMODULATING; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF; FREQUENCY-CHANGING; NON-LINEAR OPTICS; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
1Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating, or modulating; Non-linear optics
01for the control of the intensity, phase, polarisation or colour 
13based on liquid crystals, e.g. single liquid crystal display cells
133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
1333Constructional arrangements; ; Manufacturing methods
1335Structural association of cells with optical devices, e.g. polarisers or reflectors
133509Filters, e.g. light shielding masks
133512Light shielding layers, e.g. black matrix
G02F 1/13394
GPHYSICS
02OPTICS
FDEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH IS MODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THE DEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY, COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g. SWITCHING, GATING, MODULATING OR DEMODULATING; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF; FREQUENCY-CHANGING; NON-LINEAR OPTICS; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
1Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating, or modulating; Non-linear optics
01for the control of the intensity, phase, polarisation or colour 
13based on liquid crystals, e.g. single liquid crystal display cells
133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
1333Constructional arrangements; ; Manufacturing methods
1339Gaskets; Spacers; Sealing of cells
13394spacers regularly patterned on the cell subtrate, e.g. walls, pillars
G03F 1/00
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
1Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
G03F 7/0007
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
0005Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
0007Filters, e.g. additive colour filters; Components for display devices
出願人
  • 凸版印刷株式会社 TOPPAN PRINTING CO., LTD. [JP/JP]; 〒1100016 東京都台東区台東一丁目5番1号 Tokyo 5-1, Taito 1-chome, Taito-ku, Tokyo 1100016, JP (AllExceptUS)
  • 釜田 敦子 KAMADA, Atsuko [JP/JP]; null (UsOnly)
  • 河本 龍士 KAWAMOTO, Ryuji [JP/JP]; null (UsOnly)
  • 白石 淳一 SHIRAISHI, Junichi [JP/JP]; null (UsOnly)
発明者
  • 釜田 敦子 KAMADA, Atsuko; null
  • 河本 龍士 KAWAMOTO, Ryuji; null
  • 白石 淳一 SHIRAISHI, Junichi; null
代理人
  • 鈴江 武彦 SUZUYE, Takehiko; 〒1050001 東京都港区虎ノ門1丁目12番9号 鈴榮特許綜合事務所内 Tokyo c/o SUZUYE & SUZUYE, 1-12-9, Toranomon, Minato-ku, Tokyo 1050001, JP
優先権情報
2006-06570010.03.2006JP
公開言語 (言語コード) 日本語 (JA)
出願言語 (言語コード) 日本語 (JA)
指定国 (国コード)
発明の名称
(EN) COLOR FILTER AND PHOTOMASK USED FOR MANUFACTURING SAME
(FR) FILTRE COLORE ET MASQUE PHOTOGRAPHIQUE UTILISE POUR FABRIQUER CELUI-CI
(JA) カラーフィルタおよびその製造に用いるフォトマスク
要約
(EN)
A color filter is characterized in that the color filter is provided with a first photo spacer and a second photo spacer having a film thickness smaller than that of the first photo spacer, and that the second photo spacer has a cross section shape wherein the longitudinal width is longer than the lateral width. The photo spacer of the color filter is provided with a first opening pattern for forming the first photo spacer, and a second opening pattern for forming the second photo spacer having the thickness smaller than that of the first photo spacer. The second opening pattern is manufactured by using a photomask having a shape wherein a lateral width is within a range of 2.0μm-10.0μm, and a ratio of the lateral width to the longitudinal width is 1:1.25 or more.
(FR)
La présente invention concerne un filtre coloré qui se caractérise en ce que celui-ci est muni d'un premier photoécarteur et d'un second photoécarteur ayant une épaisseur de film inférieure à celle du premier photoécarteur, et en ce que le second photoécarteur a une forme en section dans laquelle la largeur longitudinale est plus longue que la largeur latérale. Le photoécarteur du filtre coloré est muni d'un premier motif d'ouverture pour former le premier photoécarteur et d'un second motif d'ouverture pour former le second photoécarteur ayant une épaisseur inférieure à celle du premier photoécarteur. Le second motif d'ouverture est fabriqué en utilisant un masque photographique ayant une forme dans laquelle la largeur latérale varie entre 2.0 &mgr;m et 10.0 &mgr;m, et un rapport entre la largeur latérale et la largeur longitudinale est de 1:1,25 ou plus.
(JA)
 第1のフォトスペーサと、この第1のフォトスペーサよりも膜厚の小さい第2のフォトスペーサとを有し、前記第2のフォトスペーサは、その横幅に対して縦幅の長さが長い断面形状を有することを特徴とするカラーフィルタ。このカラーフィルタのフォトスペーサは、第1のフォトスペーサ形成用の第1の開口パターンと、この第1のフォトスペーサよりも膜厚の小さい第2のフォトスペーサ形成用の第2の開口パターンとを有し、前記第2の開口パターンは、横幅が2.0μm~10.0μmの範囲内で、横幅:縦幅の比が1:1.25以上である形状を有するフォトマスクを用いて製造される。
他の公開
US12222665
国際事務局に記録されている最新の書誌情報