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1. WO2007102470 - 体積位相型ホログラム記録用感光性樹脂組成物及びそれを用いた光情報記録媒体

公開番号 WO/2007/102470
公開日 13.09.2007
国際出願番号 PCT/JP2007/054204
国際出願日 05.03.2007
IPC
G03H 1/02 2006.01
G物理学
03写真;映画;光波以外の波を使用する類似技術;電子写真;ホログラフイ
Hホログラフィー的方法または装置
1ホログラムを得るためまたはそれらから像を得るために光,赤外または紫外波を用いたホログラフィー的方法または装置;それに特有な細部
02細部
G03F 7/038 2006.01
G物理学
03写真;映画;光波以外の波を使用する類似技術;電子写真;ホログラフイ
Fフォトメカニカル法による凹凸化又はパターン化された表面の製造,例.印刷用,半導体装置の製造法用;そのための材料;そのための原稿;そのために特に適合した装置
7フォトメカニカル法,例.フォトリソグラフ法,による凹凸化又はパターン化された表面,例.印刷表面,の製造;そのための材料,例.フォトレジストからなるもの;そのため特に適合した装置
004感光材料
038不溶性又は特異的に親水性になる高分子化合物
CPC
G03F 7/001
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
0005Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
001Phase modulating patterns, e.g. refractive index patterns
G03F 7/033
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004Photosensitive materials
027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
032with binders
033the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
G03F 7/0388
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004Photosensitive materials
038Macromolecular compounds which are rendered insoluble or differentially wettable
0388with ethylenic or acetylenic bands in the side chains of the photopolymer
G03H 1/02
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
HHOLOGRAPHIC PROCESSES OR APPARATUS
1Holographic processes or apparatus using light, infra-red or ultra-violet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
02Details ; of features involved during the holographic process; Replication of holograms without interference recording
G03H 2001/0264
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
HHOLOGRAPHIC PROCESSES OR APPARATUS
1Holographic processes or apparatus using light, infra-red or ultra-violet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
02Details ; of features involved during the holographic process; Replication of holograms without interference recording
026Recording materials or recording processes
0264Organic recording material
G03H 2260/12
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
HHOLOGRAPHIC PROCESSES OR APPARATUS
2260Recording materials or recording processes
12Photopolymer
出願人
  • 新日鐵化学株式会社 NIPPON STEEL CHEMICAL CO., LTD. [JP/JP]; 〒1010021 東京都千代田区外神田四丁目14番1号 Tokyo 14-1, Sotokanda 4-chome, Chiyoda-ku, Tokyo1010021, JP (AllExceptUS)
  • 泊 晃平 TOMARI, Kouhei [JP/JP]; JP (UsOnly)
  • 七條 保治 SHICHIJO, Yasuji [JP/JP]; JP (UsOnly)
発明者
  • 泊 晃平 TOMARI, Kouhei; JP
  • 七條 保治 SHICHIJO, Yasuji; JP
代理人
  • 成瀬 勝夫 NARUSE, Katsuo; 〒1050003 東京都港区西新橋2丁目11番5号 TKK西新橋ビル5階 Tokyo 5th Floor, TKK Nishishinbashi Bldg., 11-5, Nishi-shinbashi 2-chome, Minato-ku, Tokyo1050003, JP
優先権情報
2006-06411009.03.2006JP
公開言語 (言語コード) 日本語 (JA)
出願言語 (言語コード) 日本語 (JA)
指定国 (国コード)
発明の名称
(EN) PHOTOSENSITIVE RESIN COMPOSITION FOR VOLUME PHASE HOLOGRAM RECORDING AND OPTICAL INFORMATION RECORDING MEDIUM USING SAME
(FR) COMPOSITION DE RÉSINE PHOTOSENSIBLE POUR L'IMPRESSION D'HOLOGRAMMES DE PHASE VOLUMIQUES ET SUPPORT D'IMPRESSION D'INFORMATIONS OPTIQUES UTILISANT CELLE-CI
(JA) 体積位相型ホログラム記録用感光性樹脂組成物及びそれを用いた光情報記録媒体
要約
(EN)
Disclosed is a volume phase hologram recording material which is excellent in photosensitivity, low curing shrinkage, transparency and especially in storage stability. Also disclosed is a recording medium. Specifically disclosed is a photosensitive resin composition for volume phase hologram recording which contains a soluble aromatic copolymer (A), a radically photopolymerizable compound (B) which is copolymerizable with the soluble aromatic copolymer (A), a photopolymerization initiator (C) and a polymer binder (D). The soluble aromatic copolymer (A) has a structural unit of a divinyl aromatic compound and a structural unit of a monovinyl aromatic compound, while containing 10-90 mol% of a structural unit represented by the formula (a1) below, and the soluble aromatic copolymer (A) has a hydroxyl equivalent of 100-30,000 g/eq, a number average molecular weight (Mn) of 400-30,000 and a molecular weight distribution (Mw/Mn) of not more than 10. The photosensitive resin composition contains 5-60% by weight of the soluble aromatic copolymer (A). (a1)
(FR)
L'invention concerne une matière d'impression d'hologrammes de phase volumiques, laquelle est excellente en termes de photosensibilité, de faible retrait au durcissement, de transparence et en particulier de stabilité au stockage. L'invention concerne également un support d'impression. L'invention concerne précisément une composition de résine photosensible pour l'impression d'hologrammes de phase volumiques, laquelle contient un copolymère aromatique soluble (A), un composé polymérisable par photopolymérisation radicalaire (B), lequel est copolymérisable avec le copolymère aromatique soluble (A), un initiateur de photopolymérisation (C) et un liant polymérique (D). Le copolymère aromatique soluble (A) a une unité de structure dérivée d'un composé aromatique divinylique et une unité de structure dérivée d'un composé aromatique monovinylique, tout en contenant 10-90 mol% d'une unité de structure représentée par la formule (a1) ci-dessous, et le copolymère aromatique soluble (A) a un équivalent en hydroxyles de 100-30 000 g/éq., un poids moléculaire moyen en nombre (Mn) de 400-30 000 et une distribution du poids moléculaire (Mw/Mn) qui n'est pas supérieure à 10. La composition de résine photosensible contient 5-60 % en poids du copolymère aromatique soluble (A). (a1)
(JA)
 光感度、低硬化収縮率、透明性、特に保存安定性に優れた体積位相型ホログラム記録材料及び記録媒体に関する。  この体積位相型ホログラム記録用感光性樹脂組成物は、ジビニル芳香族化合物の構造単位とモノビニル芳香族化合物の構造単位を有し、下記式(a1)で表される構造単位を10~90モル%含有し、水酸基当量が100~30,000g/eqであり、かつ、数平均分子量(Mn)が400~30000、分子量分布(Mw/Mn)の値が10以下である可溶性芳香族共重合体(A)、可溶性芳香族共重合体(A)と共重合可能な光ラジカル重合性化合物(B)、光重合開始剤(C)及び高分子結合剤(D)を含み、感光性樹脂組成物中に可溶性芳香族共重合体(A)を5~60重量%含んでなる。
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