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出願の表示

1. WO2007004647 - 炭素膜

公開番号 WO/2007/004647
公開日 11.01.2007
国際出願番号 PCT/JP2006/313315
国際出願日 04.07.2006
IPC
C23C 16/26 2006.1
C化学;冶金
23金属質材料への被覆;金属質材料による材料への被覆;化学的表面処理;金属質材料の拡散処理;真空蒸着,スパッタリング,イオン注入法,または化学蒸着による被覆一般;金属質材料の防食または鉱皮の抑制一般
C金属質への被覆;金属材料による材料への被覆;表面への拡散,化学的変換または置換による,金属材料の表面処理;真空蒸着,スパッタリング,イオン注入法または化学蒸着による被覆一般
16ガス状化合物の分解による化学的被覆であって,表面材料の反応生成物を被覆層中に残さないもの,すなわち化学蒸着(CVD)法
22金属質材料以外の無機質材料の析出に特徴のあるもの
26炭素のみの析出
C01B 31/02 2006.1
C化学;冶金
01無機化学
B非金属元素;その化合物
31炭素;その化合物
02炭素の製造;精製
C03C 17/22 2006.1
C化学;冶金
03ガラス;鉱物またはスラグウール
Cガラス,うわ薬またはガラス質ほうろうの化学組成;ガラスの表面処理;ガラス,鉱物またはスラグ製の繊維またはフィラメントの表面処理;ガラスのガラスまたは他物質への接着
17繊維やフィラメントの形態をとらないガラス,例.結晶化ガラス,の被覆による表面処理
22他の無機物によるもの
CPC
C03C 17/007
CCHEMISTRY; METALLURGY
03GLASS; MINERAL OR SLAG WOOL
CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
17Surface treatment of glass, not in the form of fibres or filaments, by coating
006with materials of composite character
007containing a dispersed phase, e.g. particles, fibres or flakes, in a continuous phase
C03C 17/3411
CCHEMISTRY; METALLURGY
03GLASS; MINERAL OR SLAG WOOL
CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
17Surface treatment of glass, not in the form of fibres or filaments, by coating
34with at least two coatings having different compositions
3411with at least two coatings of inorganic materials
C03C 2217/42
CCHEMISTRY; METALLURGY
03GLASS; MINERAL OR SLAG WOOL
CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
2217Coatings on glass
40Coatings comprising at least one inhomogeneous layer
42consisting of particles only
C03C 2218/153
CCHEMISTRY; METALLURGY
03GLASS; MINERAL OR SLAG WOOL
CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
2218Methods for coating glass
10Deposition methods
15from the vapour phase
152by cvd
153by plasma-enhanced cvd
C23C 16/0272
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
16Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
02Pretreatment of the material to be coated
0272Deposition of sub-layers, e.g. to promote the adhesion of the main coating
C23C 16/26
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
16Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
22characterised by the deposition of inorganic material, other than metallic material
26Deposition of carbon only
出願人
  • 独立行政法人産業技術総合研究所 NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY [JP]/[JP] (AllExceptUS)
  • 長谷川 雅考 HASEGAWA, Masataka [JP]/[JP] (UsOnly)
  • 津川 和夫 TSUGAWA, Kazuo [JP]/[JP] (UsOnly)
  • 古賀 義紀 KOGA, Yoshinori [JP]/[JP] (UsOnly)
  • 石原 正統 ISHIHARA, Masatou [JP]/[JP] (UsOnly)
  • 飯島 澄男 IIJIMA, Sumio [JP]/[JP] (UsOnly)
発明者
  • 長谷川 雅考 HASEGAWA, Masataka
  • 津川 和夫 TSUGAWA, Kazuo
  • 古賀 義紀 KOGA, Yoshinori
  • 石原 正統 ISHIHARA, Masatou
  • 飯島 澄男 IIJIMA, Sumio
優先権情報
2005-19462804.07.2005JP
公開言語 (言語コード) 日本語 (ja)
出願言語 (言語コード) 日本語 (JA)
指定国 (国コード)
発明の名称
(EN) CARBON FILM
(FR) FILM EN CARBONE
(JA) 炭素膜
要約
(EN) A carbon film which has carbon particles having the same particle size as one another ranging from 1 to 1000 nm (preferably 2 to 200 nm) present substantially in the thickness direction of the film and which has an amorphous substance at least on the surface of each of the carbon particles at the interfaces and/or gaps between the carbon particles, the amorphous substance serving to prevent the formation of an impurity during the formation of the carbon particles and/or the growth of the carbon particles. The carbon film or the like retains a high transparency, has optical properties of a high refractive index and a low birefringence, is excellent in electrical insulation, is capable of being applied onto various substrates with good adhesion, and is also capable of being formed at a low temperature. Thus, the carbon film is extremely useful in an optical device, an optical glass, a wrist watch, an electronic circuit board, an abrasive tool or a protective film.
(FR) La présente invention concerne un film contenant des particules de carbone ayant toutes la même taille comprise entre 1 et 1000 nm (de préférence entre 2 et 200 nm) présentes sensiblement dans le sens d’épaisseur du film et contenant une substance amorphe au moins sur la surface de chacune des particules de carbone aux interfaces et/ou espaces entre celles-ci, la substance amorphe servant à éviter l’apparition d’une impureté pendant la formation des particules et/ou leur croissance. Le film en carbone ou similaire conserve une forte transparence, possède les propriétés optiques d’un indice de réfraction élevé et d’une faible biréfringence, présente une excellente isolation électrique, peut être appliqué sur divers substrats avec une bonne adhérence et peut également être formé à basse température. Le film en carbone s’avère donc très utile dans un dispositif optique, un verre optique, une montre-bracelet, une carte de circuit électronique, un outil abrasif ou un film de protection.
(JA)  実質的に膜の厚さ方向に、1nm~1000nm、好ましくは2nm~200nmの同一寸法の粒径を有する炭素粒子が存在し、かつ該炭素粒子の粒界及び/又は炭素粒子間の空隙には、炭素粒子の生成に伴って生じる不純物の生成の抑制及び/又は炭素粒子の成長を抑制するための非晶質物質が少なくとも該炭素粒子の表面に存在してなる炭素膜。これらの炭素膜等は、高い透明度を保持し、屈折率が高く、複屈折性が小さいという光学的な特性を有し、電気的絶縁性に優れ、各種基材に密着性良くコーティングでき、かつ低温での形成が可能なものである。 したがって、これらの炭素膜は光デバイス、光学ガラス、腕時計、電子回路用基板、研磨用工具または保護膜として極めて有用なものである。
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