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1. US20100044340 - METHOD OF FABRICATING MAGNETIC DEVICE

官庁 アメリカ合衆国
出願番号 12556987
出願日 10.09.2009
公開番号 20100044340
公開日 25.02.2010
公報種別 A1
IPC
B 処理操作;運輸
44
装飾技術
C
装飾効果の創作;モザイク;寄せ木細工;紙張り
1
特に他のどこにも属さない,装飾表面効果の創作方法
22
表面材料の除去,例.彫刻によるもの,腐食によるもの
出願人 CANON ANELVA CORPORATION
発明者 Kodaira Yoshimitsu
Osada Tomoaki
代理人 FITZPATRICK CELLA HARPER & SCINTO
優先権情報 JP07057689 30.03.2007 WO
発明の名称
(EN) METHOD OF FABRICATING MAGNETIC DEVICE
要約
(EN)

A magnetic device is fabricated by etching a magnetic film in an atmosphere of plasma using a non-organic film as a mask. An atmosphere of plasma is generated by using at least one kind of gasifying compound selected from a gasifying compound group consisting of ethers, aldehydes, carboxylic acids, esters and diones; and by using a non-organic material mask, etching a magnetic film or diamagnetic film which includes at least one kind of metal selected from a metal group consisting of VIII group, IX group and X group elements in a periodic table. As a gas in the atmosphere of plasma, at least one kind of gas selected from a gas group consisting of oxygen, ozone, nitrogen, H2O, N2O, NO2 and CO2 can be added to the gasifying compound. The etching rate and the etching ratio were favorable.