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1. KR1020170127548 - 탄탈 스퍼터링 타깃 및 그 제조 방법

官庁
大韓民国
出願番号 1020177029390
出願日 17.05.2016
公開番号 1020170127548
公開日 21.11.2017
特許番号 102074047
特許付与日 05.02.2020
公報種別 B1
IPC
C23C 14/34
C化学;冶金
23金属質材料への被覆;金属質材料による材料への被覆;化学的表面処理;金属質材料の拡散処理;真空蒸着,スパッタリング,イオン注入法,または化学蒸着による被覆一般;金属質材料の防食または鉱皮の抑制一般
C金属質への被覆;金属材料による材料への被覆;表面への拡散,化学的変換または置換による,金属材料の表面処理;真空蒸着,スパッタリング,イオン注入法または化学蒸着による被覆一般
14被覆形成材料の真空蒸着,スパッタリングまたはイオン注入法による被覆
22被覆の方法に特徴のあるもの
34スパッタリング
C22C 27/02
C化学;冶金
22冶金;鉄または非鉄合金;合金の処理または非鉄金属の処理
C合金
27レニウムまたはグループC22C14/00もしくはC22C16/00において述べられていない耐火金属を基とする合金
02バナジウム,ニオブまたはタンタルを基とする合金
CPC
C23C 14/3407
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22characterised by the process of coating
34Sputtering
3407Cathode assembly for sputtering apparatus, e.g. Target
C22C 27/02
CCHEMISTRY; METALLURGY
22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
CALLOYS
27Alloys based on rhenium or a refractory metal not mentioned in groups C22C14/00 or C22C16/00
02Alloys based on vanadium, niobium, or tantalum
C23C 14/3414
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22characterised by the process of coating
34Sputtering
3407Cathode assembly for sputtering apparatus, e.g. Target
3414Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
出願人 제이엑스금속주식회사
発明者 나가츠 고타로
센다 신이치로
代理人 특허법인코리아나
優先権情報 JP-P-2015-104295 22.05.2015 JP
発明の名称
(KO) 탄탈 스퍼터링 타깃 및 그 제조 방법
要約
(KO) 후방 산란 전자 회절법을 사용하여 타깃의 스퍼터면에 대하여 수직의 단면인 압연면 법선 방향 : ND 를 관찰하였을 때, {111} 면이 ND 로 배향하고 있는 결정립의 면적률이 35 % 이상인 탄탈 스퍼터링 타깃. 본 발명은, 하이 파워 스퍼터 상황하에 있어서, 스퍼터 물질의 직진성을 증대시킴으로써, 웨이퍼면 상에 스퍼터 물질을 균일하게 성막하는 것이 가능한 탄탈 스퍼터링 타깃을 제공하는 것을 과제로 한다. 이와 같은 탄탈 타깃을 사용하여 스퍼터한 경우, 미세 배선에 있어서도, 막두께의 균일성과 성막의 스루풋을 향상시킬 수 있다.