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1. KR1020170121281 - 용기용 강판 및 용기용 강판의 제조 방법

官庁 大韓民国
出願番号 1020177027725
出願日 15.04.2016
公開番号 1020170121281
公開日 01.11.2017
特許番号 1019860340000
特許付与日 04.06.2019
公報種別 B1
IPC
C23C 28/00
C化学;冶金
23金属質材料への被覆;金属質材料による材料への被覆;化学的表面処理;金属質材料の拡散処理;真空蒸着,スパッタリング,イオン注入法,または化学蒸着による被覆一般;金属質材料の防食または鉱皮の抑制一般
C金属質への被覆;金属材料による材料への被覆;表面への拡散,化学的変換または置換による,金属材料の表面処理;真空蒸着,スパッタリング,イオン注入法または化学蒸着による被覆一般
28メイングループC23C2/00からC23C26/00の単一のメイングループに分類されない方法によるかまたはサブクラスC23CおよびC25Dに分類される方法の組合わせによる少なくとも2以上の重ね合わせ被覆層を得るための被覆
C25D 11/00
C化学;冶金
25電気分解または電気泳動方法;そのための装置
D電気分解または電気泳動による被覆方法;電鋳;電気分解による加工品の接合;そのための装置
11表面反応による電解被覆,すなわち転換層の形成
C25D 5/50
C化学;冶金
25電気分解または電気泳動方法;そのための装置
D電気分解または電気泳動による被覆方法;電鋳;電気分解による加工品の接合;そのための装置
5方法に特徴のある電気鍍金;加工品の前処理または後処理
48電気鍍金表面の後処理
50熱処理
C25D 9/08
C化学;冶金
25電気分解または電気泳動方法;そのための装置
D電気分解または電気泳動による被覆方法;電鋳;電気分解による加工品の接合;そのための装置
9金属以外での電解被覆
04無機材料
08陰極方法によるもの
CPC
C23C 28/34
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
28Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
30Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
34including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
C23C 28/321
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
28Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
30Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
32including at least one pure metallic layer
321with at least one metal alloy layer
C23C 28/322
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
28Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
30Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
32including at least one pure metallic layer
322only coatings of metal elements only
C25D 11/00
CCHEMISTRY; METALLURGY
25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
11Electrolytic coating by surface reaction, i.e. forming conversion layers
C25D 5/50
CCHEMISTRY; METALLURGY
25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
5Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
48After-treatment of electroplated surfaces
50by heat-treatment
C25D 5/505
CCHEMISTRY; METALLURGY
25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
5Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
48After-treatment of electroplated surfaces
50by heat-treatment
505of electroplated tin coatings, e.g. by melting
出願人 닛폰세이테츠 가부시키가이샤
発明者 다치키 아키라
히라노 시게루
다니 요시아키
요코야 히로카즈
야나기하라 모리오
가와바타 마코토
代理人 양영준
최인호
성재동
優先権情報 JP-P-2015-083984 16.04.2015 JP
発明の名称
(KO) 용기용 강판 및 용기용 강판의 제조 방법
要約
(KO)
이 용기용 강판은 강판과, 상기 강판의 상층으로서 형성되고, 금속 Sn량으로 환산해서 560 내지 5600mg/m의 Sn을 함유하는 Sn 도금층과, 상기 Sn 도금층의 상층으로서 형성되고, 금속 Zr량으로 환산해서 3.0 내지 30.0mg/m의 Zr 화합물과, 금속 Mg량으로 환산해서 0.50 내지 5.00mg/m의 Mg 화합물을 함유하는 화성 처리 피막층을 구비한다. 2 2 2