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1. CN113727827 - METHOD FOR PRODUCING PLASTIC ELEMENT HAVING FINE IRREGULAR STRUCTURE ON SURFACE THEREOF

官庁
中華人民共和国
出願番号 201980095688.7
出願日 11.06.2019
公開番号 113727827
公開日 30.11.2021
公報種別 A
IPC
B29C 59/00
B処理操作;運輸
29プラスチックの加工;可塑状態の物質の加工一般
Cプラスチックの成形または接合;他に分類されない可塑状態の材料の成形;成形品の後処理,例.補修
59表面成形,例.エンボス;そのための装置
C08J 7/00
C化学;冶金
08有機高分子化合物;その製造または化学的加工;それに基づく組成物
J仕上げ;一般的混合方法;サブクラスC08B,C08C,C08F,C08GまたはC08Hに包含されない後処理(プラスチックの加工,例.成形B29)
7高分子物質から製造された成形体の処理または被覆
CPC
C08J 7/00
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G
7Chemical treatment or coating of shaped articles made of macromolecular substances
H01J 37/32394
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
32Gas-filled discharge tubes, ; e.g. for surface treatment of objects such as coating, plating, etching, sterilising or bringing about chemical reactions
32009Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
32394Treating interior parts of workpieces
G02B 1/118
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
1Optical elements characterised by the material of which they are made
10Optical coatings produced by application to, or surface treatment of, optical elements
11Anti-reflection coatings
118having sub-optical wavelength surface structures designed to provide an enhanced transmittance, e.g. moth-eye structures
B29C 59/14
BPERFORMING OPERATIONS; TRANSPORTING
29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
59Surface shaping ; of articles; , e.g. embossing; Apparatus therefor
14by plasma treatment
B29K 2995/0072
BPERFORMING OPERATIONS; TRANSPORTING
29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
KINDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR ; MOULDS, ; REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
2995Properties of moulding materials, reinforcements, fillers, preformed parts or moulds
0037Other properties
0072Roughness, e.g. anti-slip
B29K 2995/0093
BPERFORMING OPERATIONS; TRANSPORTING
29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
KINDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR ; MOULDS, ; REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
2995Properties of moulding materials, reinforcements, fillers, preformed parts or moulds
0037Other properties
0093hydrophobic
出願人 NALUX CO., LTD.
纳卢克斯株式会社
発明者 TANIBE KENJI
谷边健志
YAMAMOTO KAZUYA
山本和也
代理人 北京三友知识产权代理有限公司 11127
北京三友知识产权代理有限公司 11127
発明の名称
(EN) METHOD FOR PRODUCING PLASTIC ELEMENT HAVING FINE IRREGULAR STRUCTURE ON SURFACE THEREOF
(ZH) 在表面具备微细凹凸结构的塑料元件的制造方法
要約
(EN) Provided is a method for producing a plastic element having a fine irregular structure on a surface thereof, the method making it possible to directly generate, on the surface of the plastic element, a fine irregular structure having a desired pitch and a depth of a desired value by a reactive ion etching process. The method for producing a plastic element having a fine irregular structure on a surface thereof comprises: a first step in which, by reactive ion etching performed in an atmosphere of a first gas, a fine irregular structure having an average pitch of a predetermined value ranging from 0.05 to 1 micrometers is formed on the surface of the plastic element; and a second step in which, by reactive ion etching performed in an atmosphere of a second gas having lower reactivity to the plastic element than reactivity of the first gas to the plastic element, an average depth of the fine irregular structure is made a predefined value ranging from 0.15 to 1.5 micrometers while the predetermined value of the average pitch is substantially maintained.
(ZH) 本发明提供在表面具备微细凹凸结构的塑料元件的制造方法,其能够通过反应性离子蚀刻工艺在塑料元件的表面直接生成所期望的间距和所期望值的深度的微细凹凸结构。一种在表面具备微细凹凸结构的塑料元件的制造方法,其包括下述步骤:第1步骤,通过第1气体气氛的反应性离子蚀刻在该塑料元件的表面生成0.05微米至1微米范围的特定值的平均间距的微细凹凸结构;以及第2步骤,通过第2气体气氛中的反应性离子蚀刻在大致维持平均间距的该特定值的同时使该微细凹凸结构的平均深度为0.15微米至1.5微米范围的特定值,该第2气体对该塑料元件的反应性比该第1气体对该塑料元件的反应性低。