(EN) Provided is a method for producing a plastic element having a fine irregular structure on a surface thereof, the method making it possible to directly generate, on the surface of the plastic element, a fine irregular structure having a desired pitch and a depth of a desired value by a reactive ion etching process. The method for producing a plastic element having a fine irregular structure on a surface thereof comprises: a first step in which, by reactive ion etching performed in an atmosphere of a first gas, a fine irregular structure having an average pitch of a predetermined value ranging from 0.05 to 1 micrometers is formed on the surface of the plastic element; and a second step in which, by reactive ion etching performed in an atmosphere of a second gas having lower reactivity to the plastic element than reactivity of the first gas to the plastic element, an average depth of the fine irregular structure is made a predefined value ranging from 0.15 to 1.5 micrometers while the predetermined value of the average pitch is substantially maintained.
(ZH) 本发明提供在表面具备微细凹凸结构的塑料元件的制造方法，其能够通过反应性离子蚀刻工艺在塑料元件的表面直接生成所期望的间距和所期望值的深度的微细凹凸结构。一种在表面具备微细凹凸结构的塑料元件的制造方法，其包括下述步骤：第1步骤，通过第1气体气氛的反应性离子蚀刻在该塑料元件的表面生成0.05微米至1微米范围的特定值的平均间距的微细凹凸结构；以及第2步骤，通过第2气体气氛中的反应性离子蚀刻在大致维持平均间距的该特定值的同时使该微细凹凸结构的平均深度为0.15微米至1.5微米范围的特定值，该第2气体对该塑料元件的反应性比该第1气体对该塑料元件的反应性低。
