(EN) The invention relates to a vapor deposition mask, a vapor deposition mask with a glass substrate, and a mask sheet with a glass substrate. A vapor deposition mask is provided with: a mask part which is formed of an iron-nickel alloy, is provided with a contact surface that comes into contact with a vapor deposition target and a non-contact surface on the opposite side of the contact surface, is formed in a sheet shape, and has a plurality of mask holes that penetrate from a first opening located in the non-contact surface to a second opening located in the contact surface, wherein the size of the second opening is smaller than that of the first opening; and a mask frame having a weld mark welded to the non-contact surface, the mask frame having higher rigidity than the mask portion, the mask frame being formed in a frame shape surrounding the plurality of mask holes, the weld mark being formed by welding the mask frame and the mask portion by means of a laser beam, and the laser beam passing through a resin layer bonded to the contact surface of the mask part and a glass substrate bonded to the mask part via the resin layer and irradiating a portion of the mask part that is in contact with the mask frame.
(ZH) 本发明涉及蒸镀掩模、带玻璃基板的蒸镀掩模及带玻璃基板的掩模片材。蒸镀掩模具备:掩模部,由铁‑镍系合金形成,具备与蒸镀对象接触的接触面以及接触面的相反侧的非接触面,形成为片状,并且具有从位于非接触面的第一开口贯通至位于接触面的第二开口的多个掩模孔,第二开口的大小与第一开口的大小相比较小;及掩模框架,具备与非接触面焊接的焊接痕,并且与掩模部相比具有更高的刚性,形成为将多个掩模孔包围的框状,焊接痕是利用激光光线对掩模框架与掩模部进行焊接而形成的,该激光光线经过与掩模部的接触面接合的树脂层以及经由树脂层而与掩模部接合的玻璃基板对掩模部之中的与掩模框架相接的部分进行照射。