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1. CN108779977 - MARKER

官庁 中華人民共和国
出願番号 201780017731.9
出願日 28.02.2017
公開番号 108779977
公開日 09.11.2018
公報種別 A
IPC
G01B 11/00
G物理学
01測定;試験
B長さ,厚さまたは同種の直線寸法の測定;角度の測定;面積の測定;表面または輪郭の不規則性の測定
11光学的手段の使用によって特徴づけられた測定装置
G01B 11/26
G物理学
01測定;試験
B長さ,厚さまたは同種の直線寸法の測定;角度の測定;面積の測定;表面または輪郭の不規則性の測定
11光学的手段の使用によって特徴づけられた測定装置
26角度またはテーパ測定用;軸の心合せ試験用
G02B 3/00
G物理学
02光学
B光学要素,光学系,または光学装置
3単レンズまたは複合レンズ
G03B 35/00
G物理学
03写真;映画;光波以外の波を使用する類似技術;電子写真;ホログラフイ
B写真を撮影するためのまたは写真を投影もしくは直視するための装置または配置;光波以外の波を用いる類似技術を用いる装置または配置;そのための付属品
35立体写真
CPC
G02B 3/005
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
3Simple or compound lenses
0006Arrays
0037characterized by the distribution or form of lenses
005arranged along a single direction only, e.g. lenticular sheets
G01B 11/00
GPHYSICS
01MEASURING; TESTING
BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
11Measuring arrangements characterised by the use of optical means
G01B 11/26
GPHYSICS
01MEASURING; TESTING
BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
11Measuring arrangements characterised by the use of optical means
26for measuring angles or tapers; for testing the alignment of axes
G03B 35/00
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
BAPPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
35Stereoscopic photography
G02B 3/06
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
3Simple or compound lenses
02with non-spherical faces
06with cylindrical or toric faces
G02B 27/18
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
27Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
18for optical projection, e.g. combination of mirror and condenser and objective
出願人 ENPLAS CORPORATION
恩普乐股份有限公司
発明者 SAITO TOMOHIRO
齐藤共启
代理人 北京鸿元知识产权代理有限公司 11327
北京鸿元知识产权代理有限公司 11327
優先権情報 2016-058546 23.03.2016 JP
発明の名称
(EN) MARKER
(ZH) 标志器
要約
(EN)
A marker according to the present invention is formed of a translucent material, and comprises at least: a plurality of protruding surfaces arranged in a first direction; and a plurality of portions to be detected which are arranged at positions on the reverse side to the plurality of protruding surfaces and which are projected, as optically detectable images, onto the plurality of protruding surfaces. Each of the cross-sectional shapes of the plurality of protruding surfaces in a cross section in the height direction of the marker along the first direction is a curved line having a curvatureradius which increases with increase in a distance from the vertex of the curved line.

(ZH)
本发明的标志器是由具有透光性的材料形成的标志器,其具有:多个凸面,至少沿着第一方向配置;以及多个被检测部,配置于与所述多个凸面呈表里关系的位置,且作为能够以光学的方式检测出来的像被投影于所述多个凸面,沿着所述第一方向的所述标志器的高度方向的剖面中的、所述多个凸面的每一个的剖面形状为,随着远离其顶点曲率半径变大的曲线。