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1. MX2013008616 - COMPOSICION A BASE DE MONOMEROS DE ACIDO SULFONICO.

Office Mexique
Numéro de la demande 2013008616
Date de la demande 25.07.2013
Numéro de publication 2013008616
Date de publication 30.01.2014
Type de publication A
CIB
C09D 133/00
CCHIMIE; MÉTALLURGIE
09COLORANTS; PEINTURES; PRODUITS À POLIR; RÉSINES NATURELLES; ADHÉSIFS; COMPOSITIONS NON PRÉVUES AILLEURS; UTILISATIONS DE SUBSTANCES, NON PRÉVUES AILLEURS
DCOMPOSITIONS DE REVÊTEMENT, p.ex. PEINTURES, VERNIS OU VERNIS-LAQUES; APPRÊTS EN PÂTE; PRODUITS CHIMIQUES POUR ENLEVER LA PEINTURE OU L'ENCRE; ENCRES; CORRECTEURS LIQUIDES; COLORANTS POUR BOIS; PRODUITS SOLIDES OU PÂTEUX POUR COLORIAGE OU IMPRESSION; EMPLOI DE MATÉRIAUX À CET EFFET
133Compositions de revêtement à base d'homopolymères ou de copolymères de composés possédant un ou plusieurs radicaux aliphatiques non saturés, chacun ne contenant qu'une seule liaison double carbone-carbone et l'un au moins étant terminé par un seul radical carboxyle, ou ses sels, anhydrides, esters, amides, imides ou nitriles; Compositions de revêtement à base de dérivés de tels polymères
CPC
C08F 212/14
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
212Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
02Monomers containing only one unsaturated aliphatic radical
04containing one ring
14substituted by heteroatoms or groups containing heteroatoms
C08F 220/34
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
220Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
02Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
10Esters
34Esters containing nitrogen ; , e.g. N,N-dimethylaminoethyl (meth)acrylate
C08F 220/38
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
220Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
02Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
10Esters
38Esters containing sulfur
C08F 220/58
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
220Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
02Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
52Amides or imides
54Amides ; , e.g. N,N-dimethylacrylamide or N-isopropylacrylamide
58containing oxygen in addition to the carbonamido oxygen ; , e.g. N-methylolacrylamide, N-(meth)acryloylmorpholine
C08L 33/24
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
33Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
24Homopolymers or copolymers of amides or imides
C09D 7/65
CCHEMISTRY; METALLURGY
09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
7Features of coating compositions, not provided for in group C09D5/00
40Additives
65macromolecular
Déposants ROHM AND HAAS COMPANY
Inventeurs Kevin J. HENDERSON
Thomas H. KALANTAR
Lidaris SAN MIGUEL RIVERA
Anurima SINGH
Antony VAN DYK
Données relatives à la priorité 61/677,561 31.07.2012 US
Titre
(EN) COMPOSICION A BASE DE MONOMEROS DE ACIDO SULFONICO.
(ES) COMPOSICION A BASE DE MONOMEROS DE ACIDO SULFONICO.
Abrégé
(EN)
The present invention relates to a composition comprising a water-soluble dispersant comprising structural units of a sulfonic acid monomer or a salt thereof and a co-monomer. The dispersant of the present invention addresses a need in the art by providing a way to improve the hiding efficiency of coatings compositions.

(ES)
La presente invención se refiere a una composición que comprende un dispersante soluble en agua que comprende unidades estructurales de un monómero de ácido sulfónico o una sal del mismo y un co-monómero. El dispersante de la presente invención se dirige a una necesidad en la técnica de proporcionar una manera de mejorar la eficiencia de encubrimiento de las composiciones de revestimiento.

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