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1. WO2020240179 - LITHOGRAPHIE PAR SONDE À BALAYAGE

Note: Texte fondé sur des processus automatiques de reconnaissance optique de caractères. Seule la version PDF a une valeur juridique

[ EN ]

Claims

1. A method of scanning probe lithography, the method comprising:

characterising a geometry of a tip of a probe;

receiving an indication of a line to be formed on a substantially planar surface, wherein the width of the line varies along the length of the line;

mapping the geometry of the tip to a geometry of the line to determine a set of instructions for forming the line on the planar surface; and

controlling the probe to form the line on the surface according to the set of instructions, wherein controlling the probe comprises controlling the orientation of the probe about an axis substantially perpendicular to the plane of the surface.

2. The method as claimed in claim 1 , wherein characterising the geometry of the tip of the probe comprises:

scanning the tip in a first direction over a known surface topography and measuring the deflection of the tip;

scanning the tip in a second direction, different from the first direction, over the known surface topography and measuring the deflection of the tip; and

determining, from the deflection measurements, a geometry of the tip of the probe.

3. The method as claimed in claim 2, wherein the first direction and the second direction are perpendicular.

4. The method as claimed in any preceding claim, wherein the method further comprises determining the geometry of the line to be formed according to the received indication of the line.

5. The method as claimed in any preceding claim, wherein mapping the geometry of the tip to the geometry of the line comprises comparing the geometry of the line with a geometry of a particular topographical feature or pattern.

6. The method as claimed in claim 5, further comprising using the comparison to determine a movement of the probe tip for forming the geometry of the line.

7. The method as claimed in any preceding claim, wherein the set of instructions define a path for the probe to follow.

8. The method as claimed in any preceding claim, wherein controlling the probe to form the line comprises moving the probe tip over the planar surface in a single pass to form the line.

9 The method as claimed in any preceding claim, wherein controlling the probe to form the line comprises moving the probe relative to the surface such that material is removed from the surface by the tip.

10. The method as claimed in any of claims 1 to 8, wherein controlling the probe to form the line comprises moving the probe relative to the surface while material is deposited into the surface from the tip.

11. The method as claimed in any preceding claim wherein the probe comprises a mount on which the tip is mounted, and the tip has a first end proximal to the mount and a second end distal to the mount, wherein the cross-section of the second end of the tip is asymmetric.

12. The method as claimed in any claim 11 , wherein the distal end of the tip has a first dimension in the direction in the plane of the cross-section which is greater than a second dimension in a direction in the plane of the cross-section

perpendicular to the first dimension.

13. The method as claimed in any preceding claim, wherein the tip comprises a plurality of projections.

14. The method as claimed in claim 13, wherein the plurality of projections are integrally formed.

15. The method as claimed in any preceding claim, wherein the tip comprises one or more recesses that extend across the tip.

16. The method as claimed in claim 15, wherein the recess has a substantially rectangular cross-section.

17. A system for scanning probe lithography, the system comprising:

a probe, comprising:

a tip for forming lines on a substantially planar surface; and a mount on which the tip is mounted for controlling the orientation of the tip;

wherein the tip has a first end proximal to the mount and a second end distal to the mount, wherein the cross section of the second end of the tip is non-circular; and

a processor, configured to:

characterise the geometry of the tip of the probe;

receive an indication of a line to be formed on the, wherein the width of the line varies along the length of the line;

map the geometry of the tip to a geometry of the line to determine a set of instructions for forming the line on the planar surface;

control the probe to form the line on the surface according to the set of instructions, wherein controlling the probe comprises controlling the orientation of the probe about an axis substantially perpendicular to the plane of the surface.

18. The system as claimed in claim 17, wherein the processor comprises a control unit for controlling the position and/or orientation of the tip of the probe.

19. The system as claimed in claim 17 or 18, wherein the system comprises a sensor configured to measure the deflection of the probe.

20. The system as claimed in claim 19, wherein the processor is configured to characterise the geometry of the tip of the probe using deflection measurements from the sensor.