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1. WO2020108892 - MODULE POUR UN APPAREIL D'EXPOSITION PAR PROJECTION POUR LA LITHOGRAPHIE À SEMI-CONDUCTEUR AVEC UN ESPACEUR SEMI-ACTIF, ET PROCÉDÉ D'UTILISATION DE L'ESPACEUR SEMI-ACTIF

Note: Texte fondé sur des processus automatiques de reconnaissance optique de caractères. Seule la version PDF a une valeur juridique

[ EN ]

Patent Claims

1. Module (62, 72) for a projection exposure apparatus (1 , 31 ) for semiconductor li thography, comprising at least one optical element (18, 19, 20, 38) arranged in a holder (50, 50'), wherein at least one spacer (52) is arranged between the holder (50) and a further holder (50') or a main body (54),

characterized in that

the spacer (52) is designed to semi-actively vary its extent.

2. Module (62, 72) according to Claim 1 ,

characterized in that

the spacer (52) comprises a piezoelectric material.

3. Module (62, 72) according to Claim 1 or 2,

characterized in that

an intermediate element (57) is arranged between the holder (50, 50') and the spacer (52) or between the holder (50) and the main body (54).

4. Module (62, 72) according to Claim 3,

characterized in that

the intermediate element (57) is designed as a passive spacer.

5. Module (62, 72) according to any of the preceding claims,

characterized in that

a first holder (50) is mounted on a second holder (50') or on a main body (54) in a statically determinate manner.

6. Module (62, 72) according to any of Claims 1 to 4,

characterized in that

a first holder (50) is mounted on a second holder (50') or on a main body (54) in a statically overdeterminate manner.

7. Module (62, 72) according to any of the preceding claims,

characterized in that

an open-loop and closed-loop control device (59) is configured for controlling the at least one spacer (52) in order to adjust the spacing between two holders (50, 50') or between a holder (50) and a main body (54).

8. Module (62, 72) according to any of the preceding claims,

characterized in that

multiple spacers (52) are arranged such that the holder (50) is deformed by movement of the spacers (52), and wherein the holder (50) is designed such that a deformation of the holder (50) is transmitted to the optical element held by the holder (50).

9. Module (62, 72) according to any of the preceding claims,

characterized in that

a seal (56, 56') is arranged between the two holders (50, 50') or between the holder (50) and the main body (54).

10. Method for positioning at least one holder (50, 50') in a projection exposure appa ratus (1 , 31 ) for semiconductor lithography,

characterized in that

a semi-active spacer (52) is used for positioning the holder (50, 50').

1 1 . Method according to Claim 10, comprising the following method steps:

a) assembling the at least one semi-active spacer (52) onto a first holder (50), a second holder (50') or a main body (54),

b) assembling the first holder (50) with the second holder (50') or the main body (54), wherein the spacer (52) is arranged between the first holder (50) and the second holder (50') or the main body (54),

c) connecting the spacer (52) to an open-loop and closed-loop control device (59),

d) determining the position and orientation of the first holder (50) relative to the second holder (50') or the main body (54),

e) determining the deviation of the position and orientation from the setpoint posi tion and setpoint orientation,

f) aligning the holder (50) on the basis of the determined deviation by means of a temporary supply of energy by means of the open-loop and closed-loop con trol device (59),

g) checking the position and orientation of the holder (50),

h) repeating steps d) to g) until the setpoint position and setpoint orientation has been attained.

12. Method according to Claim 10, comprising the following method steps:

a) assembling the holders (50, 50'), wherein an intermediate element (57) is ar ranged at least between a first (50) and a second holder (50') for the purposes of presetting the spacing between the holders (50, 50') and/or wherein the at least one semi-active spacer (52) is arranged at least between a first (50) and a second holder (50') for the purposes of adjusting the spacing between the holders (50, 50'),

b) connecting the spacer to an open-loop and closed-loop control device, c) determining the imaging aberrations of the projection exposure apparatus (1 , 31 ),

e) determining the travel of the at least one semi-active spacer (52) for the pur poses of correcting the imaging aberrations,

f) moving the spacer (52) by means of a temporary supply of energy by means of an open-loop and closed-loop control device (59),

g) checking the imaging,

h) repeating steps c) to g) until the imaging lies within a set tolerance.

13. Method according to Claim 10, comprising the following method steps:

a) uninstalling the first holder (50),

b) installing a new holder (50) with the semi-active spacers (52),

c) connecting the spacer (52) to an open-loop and closed-loop control device (59),

d) determining the position and orientation of the holder (50) relative to the sec ond holder (50') or the main body (54),

e) determining the deviation of the position and orientation from the setpoint posi tion and setpoint orientation,

f) aligning the holder (50) in accordance with the determined deviation by means of a temporary supply of energy by means of the open-loop and closed-loop control device (59),

g) checking the position and orientation of the holder (50),

h) repeating steps d) to g) until the setpoint position and setpoint orientation has been attained.

14. Method according to Claim 10, wherein the semi-active spacer (52) is at least temporarily connected to an open-loop and closed-loop control device (59), com prising the following steps:

a) determining the imaging aberrations of the projection exposure apparatus (1 , 31 ),

b) determining the travel of the semi-active spacer (52),

c) moving the semi-active spacer (52) by the predetermined travels by means of a temporary supply of energy,

d) checking the imaging aberrations,

e) repeating steps b) to d) until the imaging aberrations lie within a set tolerance.

15. Method according to any of Claims 10, 1 1 , 13 and 14,

characterized in that,

in addition to the semi-active spacers (52), at least one additional intermediate element (57) is used as a passive spacer.

16. Method according to any of Claims 10 to 15,

characterized in that,

after the final method step, the semi-active spacers (52) are disconnected from the open-loop and closed-loop control device (59).

17. Method according to any one of Claims 9, 10 and 12,

characterized in that

the position and orientation of the holder (50) is determined by an external meas urement means.

18. Method according to any of Claims 9 to 13,

characterized in that

the position and orientation of the holder (50) is determined by means of a wave- front measurement of the projection exposure apparatus (1 , 31 ).