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1. WO2007146531 - COMPOSITION À FAIBLE INDICE DE RÉFRACTION CONTENANT UN COMPOSÉ DE FLUOROPOLYÉTHER URÉTHANE

Numéro de publication WO/2007/146531
Date de publication 21.12.2007
N° de la demande internationale PCT/US2007/068924
Date du dépôt international 15.05.2007
CIB
C08L 101/04 2006.01
CCHIMIE; MÉTALLURGIE
08COMPOSÉS MACROMOLÉCULAIRES ORGANIQUES; LEUR PRÉPARATION OU LEUR MISE EN UVRE CHIMIQUE; COMPOSITIONS À BASE DE COMPOSÉS MACROMOLÉCULAIRES
LCOMPOSITIONS CONTENANT DES COMPOSÉS MACROMOLÉCULAIRES
101Compositions contenant des composés macromoléculaires non spécifiés
02caractérisées par la présence de groupes déterminés
04contenant des atomes d'halogènes
C08L 27/12 2006.01
CCHIMIE; MÉTALLURGIE
08COMPOSÉS MACROMOLÉCULAIRES ORGANIQUES; LEUR PRÉPARATION OU LEUR MISE EN UVRE CHIMIQUE; COMPOSITIONS À BASE DE COMPOSÉS MACROMOLÉCULAIRES
LCOMPOSITIONS CONTENANT DES COMPOSÉS MACROMOLÉCULAIRES
27Compositions contenant des homopolymères ou des copolymères de composés possédant un ou plusieurs radicaux aliphatiques non saturés, chacun ne contenant qu'une seule liaison double carbone-carbone et l'un au moins étant terminé par un halogène; Compositions contenant des dérivés de tels polymères
02non modifiées par un post-traitement chimique
12contenant du fluor
C08J 5/18 2006.01
CCHIMIE; MÉTALLURGIE
08COMPOSÉS MACROMOLÉCULAIRES ORGANIQUES; LEUR PRÉPARATION OU LEUR MISE EN UVRE CHIMIQUE; COMPOSITIONS À BASE DE COMPOSÉS MACROMOLÉCULAIRES
JMISE EN ŒUVRE; PROCÉDÉS GÉNÉRAUX POUR FORMER DES MÉLANGES; POST-TRAITEMENT NON COUVERT PAR LES SOUS-CLASSES C08B, C08C, C08F, C08G ou C08H149
5Fabrication d'objets ou de matériaux façonnés contenant des substances macromoléculaires
18Fabrication de bandes ou de feuilles
CPC
G03F 7/0046
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004Photosensitive materials
0046with perfluoro compounds, e.g. for dry lithography
G03F 7/027
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004Photosensitive materials
027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
G03F 7/038
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004Photosensitive materials
038Macromolecular compounds which are rendered insoluble or differentially wettable
G03F 7/0388
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004Photosensitive materials
038Macromolecular compounds which are rendered insoluble or differentially wettable
0388with ethylenic or acetylenic bands in the side chains of the photopolymer
G03F 7/091
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004Photosensitive materials
09characterised by structural details, e.g. supports, auxiliary layers
091characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
Y10T 428/24942
YSECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
10TECHNICAL SUBJECTS COVERED BY FORMER USPC
TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
428Stock material or miscellaneous articles
24Structurally defined web or sheet [e.g., overall dimension, etc.]
24942including components having same physical characteristic in differing degree
Déposants
  • 3M INNOVATIVE PROPERTIES COMPANY [US/US]; 3M Center Post Office Box 33427 Saint Paul, Minnesota 55133-3427, US (AllExceptUS)
Inventeurs
  • JING, Naiyong; US
  • KLUN, Thomas P.; US
  • CAO, Chuntao; US
  • COGGIO, William D.; US
  • QIU, Zai-ming; US
Mandataires
  • FISCHER, Carolyn A., ; 3M Center Office of Intellectual Property Counsel Post Office Box 33427 Saint Paul, Minnesota 55133-3427, US
Données relatives à la priorité
11/427,66529.06.2006US
60/804,59313.06.2006US
Langue de publication anglais (EN)
Langue de dépôt anglais (EN)
États désignés
Titre
(EN) LOW REFRACTIVE INDEX COMPOSITION COMPRISING FLUOROPOLYETHER URETHANE COMPOUND
(FR) COMPOSITION À FAIBLE INDICE DE RÉFRACTION CONTENANT UN COMPOSÉ DE FLUOROPOLYÉTHER URÉTHANE
Abrégé
(EN)
Antireflective films and low refractive index compositions are described. The low refractive index layer comprises the reaction product of a composition comprising at least one free-radically polymerizable material having a high fluorine content, and at least one free-radically polymerizable fluoropolyether urethane material.
(FR)
La présente invention concerne des films antiréfléchissants et des compositions à faible indice de réfraction. La couche à faible indice de réfraction renferme le produit de réaction d'une composition contenant au moins un matériau polymérisable à radicaux libres présentant une teneur en fluor élevée, et au moins un matériau de fluoropolyéther uréthane polymérisable à radicaux libres.
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