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1. WO2004095142 - COMPOSITION DE RESINE ET SOLVANT ORGANIQUE UTILISE POUR ELIMINER CETTE RESERVE

Note: Texte fondé sur des processus automatiques de reconnaissance optique de caractères. Seule la version PDF a une valeur juridique

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CLAIMS

1 . A resist composition comprising an alkaline soluble novolak resin, a naphtoquinonediazide photosensitive compound and an organic solvent, characterized in that the organic solvent comprises benzyl alcohol or its derivatives.

2. The resist composition according to claim 1 , characterized in that the organic solvent comprises 1 % by weight to 35 % by weight of benzyl alcohol or its derivatives.

3. A photosensitive resist composition comprising an alkaline soluble acrylic resin or novolak resin, a strong acid or a radical generating compound by irradiating UV ray, a crosslinker and an organic solvent, characterized in that the organic solvent comprises benzyl alcohol or its derivatives.

4. The resist composition according to claim 1 , characterized in that the organic solvent comprises 1 % by weight to 35 % by weight of benzyl alcohol or its derivatives.

5. An organic solvent for removing a resist, comprising benzyl alcohol or its derivatives.