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1. KR1020040092550 - RESIST COMPOSITION COMPRISING BENZYL ALCOHOL OR ITS DERIVATIVE AS ORGANIC SOLVENT, AND ORGANIC SOLVENT FOR REMOVING RESIST

Office République de Corée
Numéro de la demande 1020030026029
Date de la demande 24.04.2003
Numéro de publication 1020040092550
Date de publication 04.11.2004
Type de publication A
CIB
G03F 7/022
GPHYSIQUE
03PHOTOGRAPHIE; CINÉMATOGRAPHIE; TECHNIQUES ANALOGUES UTILISANT D'AUTRES ONDES QUE DES ONDES OPTIQUES; ÉLECTROGRAPHIE; HOLOGRAPHIE
FPRODUCTION PAR VOIE PHOTOMÉCANIQUE DE SURFACES TEXTURÉES, p.ex. POUR L'IMPRESSION, POUR LE TRAITEMENT DE DISPOSITIFS SEMI-CONDUCTEURS; MATÉRIAUX À CET EFFET; ORIGINAUX À CET EFFET; APPAREILLAGES SPÉCIALEMENT ADAPTÉS À CET EFFET
7Production par voie photomécanique, p.ex. photolithographique, de surfaces texturées, p.ex. surfaces imprimées; Matériaux à cet effet, p.ex. comportant des photoréserves; Appareillages spécialement adaptés à cet effet
004Matériaux photosensibles
022Quinonediazides
CPC
G03F 7/0226
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004Photosensitive materials
022Quinonediazides
0226characterised by the non-macromolecular additives
G03F 7/0048
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004Photosensitive materials
0048characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
Déposants CLARIANT INTERNATIONAL LTD.
클라리언트 인터내셔널 리미티드
Inventeurs OH SAE TAE
오세태
KANG DOEK MAN
강덕만
KWON HYUK JOONG
권혁중
EIJI NAITO
에지나이토
Mandataires 이병호
Titre
(EN) RESIST COMPOSITION COMPRISING BENZYL ALCOHOL OR ITS DERIVATIVE AS ORGANIC SOLVENT, AND ORGANIC SOLVENT FOR REMOVING RESIST
(KO) 레지스트 조성물 및 레지스트 제거용 유기용제
Abrégé
(EN)

PURPOSE: A resist composition and an organic solvent for removing resist are provided, to improve flowability in coating, the uniformity of a thin film on a large-sized substrate and storage stability.

CONSTITUTION: The resist composition comprises an alkali-soluble novolac resin; a naphthoquinonediazide-based photosensitive compound; and an organic solvent, wherein the organic solvent comprises 1-35 wt% of benzyl alcohol or its derivative. Also the resist composition comprises an alkali-soluble acryl-based resin or novolac resin; a compound which generates a strong acid or radical by the irradiation of UV rays; a curing agent; and an organic solvent, wherein the organic solvent comprises 1-35 wt% of benzyl alcohol or its derivative. The organic solvent for removing resist comprises benzyl alcohol or its derivative.

© KIPO 2005

(KO)
본 발명은 유기용제로서 벤질알콜 또는 그 유도체를 함유하는 레지스트 조성물을 제공한다. 구체적으로 본 발명은 알칼리 가용성 노볼락수지, 나프토퀴논디아지드계 감광성 화합물 및 유기용제를 함유하며, 상기 유기용제가 벤질알콜 또는 그 유도체를 함유하는 것을 특징으로 하는 포지티브형 포토레지스트 조성물; 및 알칼리 가용성 아크릴계수지 또는 노볼락수지, 자외선 조사에 의해 강산이나 라디칼을 발생하는 화합물, 경화제 및 유기용제를 함유하며, 상기 유기용제가 벤질알콜 또는 그 유도체를 함유하는 것을 특징으로 하는 네가티브형 포토레지스트 조성물을 제공한다.

Également publié en tant que
US2006263714