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1. JP2014192483 - METHOD OF MANUFACTURING MULTILAYER WIRING BOARD

Office Japon
Numéro de la demande 2013069058
Date de la demande 28.03.2013
Numéro de publication 2014192483
Date de publication 06.10.2014
Numéro de délivrance 6241641
Date de délivrance 17.11.2017
Type de publication B2
CIB
H05K 3/42
HÉLECTRICITÉ
05TECHNIQUES ÉLECTRIQUES NON PRÉVUES AILLEURS
KCIRCUITS IMPRIMÉS; ENVELOPPES OU DÉTAILS DE RÉALISATION D'APPAREILS ÉLECTRIQUES; FABRICATION D'ENSEMBLES DE COMPOSANTS ÉLECTRIQUES
3Appareils ou procédés pour la fabrication de circuits imprimés
40Fabrication d'éléments imprimés destinés à réaliser des connexions électriques avec ou entre des circuits imprimés
42Trous de passage métallisés
H05K 3/46
HÉLECTRICITÉ
05TECHNIQUES ÉLECTRIQUES NON PRÉVUES AILLEURS
KCIRCUITS IMPRIMÉS; ENVELOPPES OU DÉTAILS DE RÉALISATION D'APPAREILS ÉLECTRIQUES; FABRICATION D'ENSEMBLES DE COMPOSANTS ÉLECTRIQUES
3Appareils ou procédés pour la fabrication de circuits imprimés
46Fabrication de circuits multi-couches
CPC
H05K 3/421
HELECTRICITY
05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
3Apparatus or processes for manufacturing printed circuits
40Forming printed elements for providing electric connections to or between printed circuits
42Plated through-holes ; or plated via connections
421Blind plated via connections
C23C 18/1653
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
18Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
16by reduction or substitution, e.g. electroless plating
1601Process or apparatus
1633Process of electroless plating
1646Characteristics of the product obtained
165Multilayered product
1653Two or more layers with at least one layer obtained by electroless plating and one layer obtained by electroplating
C23C 18/405
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
18Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
16by reduction or substitution, e.g. electroless plating
31Coating with metals
38Coating with copper
40using reducing agents
405Formaldehyde
C25D 3/38
CCHEMISTRY; METALLURGY
25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
3Electroplating: Baths therefor
02from solutions
38of copper
C25D 5/02
CCHEMISTRY; METALLURGY
25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
5Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
02Electroplating of selected surface areas
C25D 5/10
CCHEMISTRY; METALLURGY
25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
5Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
10Electroplating with more than one layer of the same or of different metals
Déposants HITACHI CHEMICAL CO LTD
日立化成株式会社
Inventeurs YOSHIDA NOBUYUKI
吉田 信之
Titre
(EN) METHOD OF MANUFACTURING MULTILAYER WIRING BOARD
(JA) 多層配線基板の製造方法
Abrégé
(EN)

PROBLEM TO BE SOLVED: To provide a method of manufacturing a multilayer wiring board in which plating void of an electrolytic filler plating layer can be suppressed, even for a via hole having a diameter comparable with the thickness of an insulating layer.

SOLUTION: In a method of manufacturing a multilayer wiring board in which an insulating layer and a metal foil on the upper layer thereof are laminated integrally on an inner layer in which wiring is formed, a hole for via hole is provided in the metal foil and insulating layer, and filled with an electrolytic filler plating layer after formation of a base electroless plating layer, an electrolytic filler plating layer not filling the hole for via hole completely is formed, after formation of the base electroless plating layer, and then the surface of the electrolytic filler plating layer is etched, and the hole for via hole is filled completely with the electrolytic filler plating layer.

COPYRIGHT: (C)2015,JPO&INPIT

(JA)

【課題】絶縁層厚と同程度の径を有するビアホール穴に対しても、電解フィルドめっき層のめっきボイドを抑制可能な多層配線基板の製造方法を提供する。
【解決手段】配線形成した内層材上に絶縁層とその上層に金属箔とを積層一体化し、前記金属箔及び絶縁層にビアホール用の穴を設け、下地無電解めっき層を形成した後、電解フィルドめっき層で前記ビアホール用穴を穴埋めする多層配線基板の製造方法であって、前記下地無電解めっき層の形成後に、まず前記ビアホール用穴を完全に充填しない程度の電解フィルドビアめっき層を形成し、次に前記電解フィルドめっき層の表面をエッチングした上で、電解フィルドめっき層によって前記ビアホール用穴を完全に穴埋めする多層配線基板の製造方法。
【選択図】図1

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