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1. CN101107196 - Method for purification of disilicon hexachloride and high purity disilicon hexachloride

Office Chine
Numéro de la demande 200680002738.5
Date de la demande 17.03.2006
Numéro de publication 101107196
Date de publication 16.01.2008
Numéro de délivrance 101107196
Date de délivrance 30.03.2011
Type de publication B
CIB
C01B 33/107
CCHIMIE; MÉTALLURGIE
01CHIMIE INORGANIQUE
BÉLÉMENTS NON MÉTALLIQUES; LEURS COMPOSÉS
33Silicium; Ses composés
08Composés halogénés
107Silanes halogénés
CPC
C01B 33/10784
CCHEMISTRY; METALLURGY
01INORGANIC CHEMISTRY
BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; ; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
33Silicon; Compounds thereof
08Compounds containing halogen
107Halogenated silanes
10778Purification
10784by adsorption
Déposants Toagosei Co., Ltd.
东亚合成株式会社
Inventeurs Ishikawa Koji
石川幸二
Suzuki Hiroshi
铃木浩
Kimata Yoshinori
木全良典
Mandataires wangjian
中国国际贸易促进委员会专利商标事务所 11038
Données relatives à la priorité 111438/2005 07.04.2005 JP
Titre
(EN) Method for purification of disilicon hexachloride and high purity disilicon hexachloride
(ZH) 六氯化二硅的精制方法和高纯度六氯化二硅
Abrégé
(EN)
The purpose is to provide is a method for removing silanol with good efficiency from a raw material of disilicon hexachloride containing silanol as an impurity, to thereby prepare a high purity disilicon hexachloride. A method for purifying disilicon hexachloride including a step of contacting a raw material of disilicon hexachloride containing disilicon hexachloride and silanol as an impurity with an adsorbing material such as an activated carbon, to remove the silanol. The method may further includes a distillation step. It is preferred that the above steps are carried out in an atmosphere of an inert gas.

(ZH)

本发明的目的在于提供从含有硅烷醇作为杂质的六氯化二硅原料中高效地除去硅烷醇,得到高纯度的六氯化二硅的方法。本发明的六氯化二硅的精制方法具有使含有六氯化二硅和作为杂质的硅烷醇的六氯化二硅原料与活性炭等吸附材料接触,将硅烷醇除去的工序。可以还具有进行蒸馏的工序。上述各工序优选在惰性气体气氛下进行。