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1. CN1668951 - Method for producing vertical tapers in optical waveguides by over polishing

Office
Chine
Numéro de la demande 03816669.0
Date de la demande 17.04.2003
Numéro de publication 1668951
Date de publication 14.09.2005
Numéro de délivrance 1317578
Date de délivrance 23.05.2007
Type de publication C
CIB
G02B 6/30
GPHYSIQUE
02OPTIQUE
BÉLÉMENTS, SYSTÈMES OU APPAREILS OPTIQUES
6Guides de lumière; Détails de structure de dispositions comprenant des guides de lumière et d'autres éléments optiques, p.ex. des moyens de couplage
24Couplage de guides de lumière
26Moyens de couplage optique
30pour usage entre fibre et dispositif à couche mince
CPC
G02B 6/1228
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
6Light guides
10of the optical waveguide type
12of the integrated circuit kind
122Basic optical elements, e.g. light-guiding paths
1228Tapered waveguides, e.g. integrated spot-size transformers
G02B 6/136
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
6Light guides
10of the optical waveguide type
12of the integrated circuit kind
13Integrated optical circuits characterised by the manufacturing method
136by etching
Déposants Intel Corp.
英特尔公司
Inventeurs Salib Michael
M·萨里布
Mandataires li jialin
上海专利商标事务所有限公司
Données relatives à la priorité 10160625 31.05.2002 US
Titre
(EN) Method for producing vertical tapers in optical waveguides by over polishing
(ZH) 通过过度抛光生产光波导中的垂直锥形体的方法
Abrégé
(EN) A method to form a vertical waveguide taper in a planar waveguide includes providing a substrate (10), forming a cladding layer (12) or the substrate, forming a core layer (14) on the cladding layer (12) . A protective layer (16B) with an opening is formed on the core layer (14), the opening exposing a portion of the core layer. A chemical mechanical polishing process is performed so that dishing occurs in the exposed portion, forming a depression (31) , in the core (14) with a sloped sidewall. In one embodiment, the core layer (14) is then patterned so that a portion of the core layer is removed to about the depth of the depression. This removed portion includes a part of the core layer containing the depression. The resulting structure includes an unetched sloped surface that transitions to a substantially planar etched surface. The core layer is patterned and etched again to form the waveguide, with the sloped surface forming part of the taper.
(ZH)

一种用于在平面波导中形成垂直波导锥形体的方法包括:提供基板(10);在基板上形成覆盖层(12);在覆盖层(12)上形成核心层(14)。在核心层(14)上形成具有开口的保护层(16B),该开口露出一部分核心层。使用化学机械抛光工艺从而,在暴露部分中形成凹坑,在核心层(14)中形成具有倾斜侧壁的凹坑(31)。在一个实施例中,随后,将核心层(14)形成图案,从而将一部分核心层除去到约凹坑的深度。该被除去的部分包括含凹坑的一部分核心层。最终的结构包括未被蚀刻的倾斜表面,它过度到基本平面的被蚀刻表面。再次使核心层形成图案并被蚀刻以形成波导,其中倾斜表面形成锥形体的一部分。


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