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1. CN105829873 - A low-noise sensor and an inspection system using a low-noise sensor

Office Chine
Numéro de la demande 112014000069694
Date de la demande 18.12.2014
Numéro de publication 105829873
Date de publication 03.08.2016
Type de publication A
CIB
G01N 21/88
GPHYSIQUE
01MÉTROLOGIE; TESTS
NRECHERCHE OU ANALYSE DES MATÉRIAUX PAR DÉTERMINATION DE LEURS PROPRIÉTÉS CHIMIQUES OU PHYSIQUES
21Recherche ou analyse des matériaux par l'utilisation de moyens optiques, c. à d. en utilisant des rayons infrarouges, visibles ou ultraviolets
84Systèmes spécialement adaptés à des applications particulières
88Recherche de la présence de criques, de défauts ou de souillures
G01N 21/95
GPHYSIQUE
01MÉTROLOGIE; TESTS
NRECHERCHE OU ANALYSE DES MATÉRIAUX PAR DÉTERMINATION DE LEURS PROPRIÉTÉS CHIMIQUES OU PHYSIQUES
21Recherche ou analyse des matériaux par l'utilisation de moyens optiques, c. à d. en utilisant des rayons infrarouges, visibles ou ultraviolets
84Systèmes spécialement adaptés à des applications particulières
88Recherche de la présence de criques, de défauts ou de souillures
95caractérisée par le matériau ou la forme de l'objet à analyser
CPC
G01N 21/8851
GPHYSICS
01MEASURING; TESTING
NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
21Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
84Systems specially adapted for particular applications
88Investigating the presence of flaws or contamination
8851Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
G01N 21/9501
GPHYSICS
01MEASURING; TESTING
NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
21Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
84Systems specially adapted for particular applications
88Investigating the presence of flaws or contamination
95characterised by the material or shape of the object to be examined
9501Semiconductor wafers
G01N 21/956
GPHYSICS
01MEASURING; TESTING
NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
21Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
84Systems specially adapted for particular applications
88Investigating the presence of flaws or contamination
95characterised by the material or shape of the object to be examined
956Inspecting patterns on the surface of objects
G01N 2021/95676
GPHYSICS
01MEASURING; TESTING
NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
21Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
84Systems specially adapted for particular applications
88Investigating the presence of flaws or contamination
95characterised by the material or shape of the object to be examined
956Inspecting patterns on the surface of objects
95676Masks, reticles, shadow masks
H01L 27/14636
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
27Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
14including semiconductor components sensitive to infra-red radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
144Devices controlled by radiation
146Imager structures
14601Structural or functional details thereof
14636Interconnect structures
H04N 5/3577
HELECTRICITY
04ELECTRIC COMMUNICATION TECHNIQUE
NPICTORIAL COMMUNICATION, e.g. TELEVISION
5Details of television systems
30Transforming light or analogous information into electric information
335using solid-state image sensors [SSIS]
357Noise processing, e.g. detecting, correcting, reducing or removing noise
3577for reducing electromagnetic interferences, e.g. EMI reduction, clocking noise
Déposants KLA-TENCOR CORPORATION
Inventeurs BROWN DAVID L
CHUANG YUNG-HO
FIELDEN JOHN
Données relatives à la priorité 14273424 08.05.2014 US
61/918,108 19.12.2013 US
Titre
(EN) A low-noise sensor and an inspection system using a low-noise sensor
(ZH) 低噪声传感器及使用低噪声传感器的检验系统
Abrégé
(EN)
A method of inspecting a sample at high speed includes directing and focusing radiation onto a sample, and receiving radiation from the sample and directing received radiation to an image sensor. Notably, the method includes driving the image sensor with predetermined signals. The predetermined signals minimize a settling time of an output signal of the image sensor. The predetermined signals are controlled by a phase accumulator, which is used to select look-up values. The driving can further include loading an initial phase value, selecting most significant bits of the phase accumulator, and converting the look-up values to an analog signal. In one embodiment, for each cycle of a phase clock, a phase increment can be added to the phase accumulator. The driving can be performed by a custom waveform generator.

(ZH)
本发明揭示一种高速检验样本的方法,所述方法包含:将辐射引导且聚焦到样本上;及接收来自所述样本的辐射且将所接收到的辐射引导到图像传感器。所述方法尤其包含使用预定信号驱动所述图像传感器。所述预定信号最小化所述图像传感器的输出信号的安定时间。所述预定信号由用于选择查找值的相位累加器控制。所述驱动可进一步包含加载初始相位值,选择所述相位累加器的最高有效位及将所述查找值转换为模拟信号。在一个实施例中,针对相位时钟的每一循环,可将相位增量添加到所述相位累加器。所述驱动可由定制波形产生器执行。