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1. WO2016094404 - PLATEAU DE MAINTIEN ÉLECTROSTATIQUE POUR APPLICATIONS RF À HAUTE TEMPÉRATURE

Note: Texte fondé sur des processus automatiques de reconnaissance optique de caractères. Seule la version PDF a une valeur juridique

[ EN ]

Claims:

1 . An electrostatic chuck, comprising:

a puck having a support surface to support a substrate when disposed thereon and an opposing second surface, wherein one or more chucking electrodes are embedded in the puck;

a body having a support surface coupled to the second surface of the puck to support the puck;

a DC voltage sensing circuit disposed on support surface of the puck; and an inductor disposed in the body and proximate the support surface of the body, wherein the inductor is electrically coupled to DC voltage sensing circuit, and wherein the inductor is configured to filter high frequency current flow in order to accurately measure DC potential on the substrate.

2. The electrostatic chuck of claim 1 , wherein the puck is a dielectric disk.

3. The electrostatic chuck of claim 1 , wherein the DC voltage sensing circuit includes a conductive metallic trace proximate to and disposed partially about a center portion of the puck.

4. The electrostatic chuck of claim 3, wherein the conductive metallic trace includes a linear trace portion that extends from about 0.5 inches to about 2.5 inches radially outward from the center portion of the puck, wherein the linear trace portion is electrically coupled to an electrical terminal, and wherein the electrical terminal is electrically coupled to the inductor.

5. The electrostatic chuck of claim 1 , wherein the inductor is disposed about 0.5 inches to about 2.5 inches from the support surface of the puck.

6. The electrostatic chuck of any of claims 1 -5, wherein the inductor is a ceramic inductor.

7. The electrostatic chuck of any of claims 1 -5, wherein the one or more chucking electrodes include two independently controlled electrodes embedded in the puck.

8. The electrostatic chuck of any of claims 1 -5, wherein a thickness of each of the one or more chucking electrodes is about 3 to about 5 times a calculated skin depth of the one or more chucking electrodes.

9. The electrostatic chuck of any of claims 1 -5, the one or more chucking electrodes are configured to carry about 13.56 MHz power to about 40 MHz power.

10. The electrostatic chuck of any of claims 1 -5, wherein each of the one or more chucking electrodes is made from tungsten and have a thickness of about 50 microns to about 90 microns.

1 1 . The electrostatic chuck of any of claims 1 -5, wherein the one or more chucking electrodes are coupled to a chucking power supply via a first set of one or more high temperature coaxial cables.

12. The electrostatic chuck of any of claims 1 -5, wherein the first set of one or more high temperature coaxial cables includes a high temperature jacket that can withstand temperatures of about 200° Celsius to about 500° Celsius, a solid metal RF shielding, a dielectric core, and a center conductor.

13. An electrostatic chuck, comprising:

a puck having a support surface to support a substrate when disposed thereon and an opposing second surface, wherein one or more chucking electrodes are embedded in the puck, wherein a thickness of each of the one or more chucking electrodes is about 3 to about 5 times a calculated skin depth of the one or more chucking electrodes; and

a body having a support surface coupled to the second surface of the puck to support the puck.

14. The electrostatic chuck of claim 13, wherein each of the one or more chucking electrodes is made from tungsten and have a thickness of about 50 microns to about 90 microns.

15. An electrostatic chuck, comprising:

a puck having a support surface to support a substrate when disposed thereon and an opposing second surface, wherein one or more chucking electrodes are embedded in the puck, wherein a thickness of each of the one or more chucking electrodes is about 3 to about 5 times a calculated skin depth of the one or more chucking electrodes, and wherein the one or more chucking electrodes is coupled to a chucking power supply via a set of one or more high temperature coaxial cables; a body having a support surface coupled to the second surface of the puck to support the puck;

a DC voltage sensing circuit disposed on support surface of the puck; and an inductor disposed in the body and proximate the support surface of the body, wherein the inductor is electrically coupled to DC voltage sensing circuit, and wherein the inductor is configured to filter high frequency current flow in order to accurately measure DC potential on the substrate.