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1. KR1020130006413 - MULTI-COMPONENT UNARY SPUTTERING TARGET, A MANUFACTURING METHOD THEREOF, AND A METHOD FOR MANUFACTURING NANOSTRUCTURED THIN FILMS WITH MULTI-COMPONENT ALLOY SYSTEM USING THE SAME

Office Republic of Korea
Application Number 1020120157016
Application Date 28.12.2012
Publication Number 1020130006413
Publication Date 16.01.2013
Publication Kind A
IPC
C23C 14/34
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22characterised by the process of coating
34Sputtering
C23C 14/06
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
06characterised by the coating material
B22F 9/08
BPERFORMING OPERATIONS; TRANSPORTING
22CASTING; POWDER METALLURGY
FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
9Making metallic powder or suspensions thereof; Apparatus or devices specially adapted therefor
02using physical processes
06starting from liquid material
08by casting, e.g. through sieves or in water, by atomising or spraying
B22F 3/115
BPERFORMING OPERATIONS; TRANSPORTING
22CASTING; POWDER METALLURGY
FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
3Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor
115by spraying molten metal, i.e. spray sintering, spray casting
CPC
C23C 14/0036
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
0021Reactive sputtering or evaporation
0036Reactive sputtering
B22D 7/005
BPERFORMING OPERATIONS; TRANSPORTING
22CASTING; POWDER METALLURGY
DCASTING OF METALS; CASTING OF OTHER SUBSTANCES BY THE SAME PROCESSES OR DEVICES
7Casting ingots, ; e.g. from ferrous metals
005from non-ferrous metals
B22D 21/00
BPERFORMING OPERATIONS; TRANSPORTING
22CASTING; POWDER METALLURGY
DCASTING OF METALS; CASTING OF OTHER SUBSTANCES BY THE SAME PROCESSES OR DEVICES
21Casting non-ferrous metals or metallic compounds so far as their metallurgical properties are of importance for the casting procedure; Selection of compositions therefor
B22F2998/10
BPERFORMING OPERATIONS; TRANSPORTING
22CASTING; POWDER METALLURGY
FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER
2998Supplementary information concerning processes or compositions relating to powder metallurgy
10Processes characterised by the sequence of their steps
C22C 1/045
CCHEMISTRY; METALLURGY
22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
CALLOYS
1Making alloys
04by powder metallurgy
045Alloys based on refractory metals
C22C 16/00
CCHEMISTRY; METALLURGY
22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
CALLOYS
16Alloys based on zirconium
Applicants KOREA INSTITUTE OF INDUSTRIAL TECHNOLOGY
한국생산기술연구원
Inventors SHIN, SEUNG YONG
신승용
MOON, KYOUNG IL
문경일
SUN, JU HYUN
선주현
LEE, CHANG HUN
이장훈
BAE, JUNG CHAN
배정찬
Agents 김남식
양기혁
한윤호
이인행
Priority Data 1020090112258 19.11.2009 KR
1020100111197 09.11.2010 KR
Title
(EN) MULTI-COMPONENT UNARY SPUTTERING TARGET, A MANUFACTURING METHOD THEREOF, AND A METHOD FOR MANUFACTURING NANOSTRUCTURED THIN FILMS WITH MULTI-COMPONENT ALLOY SYSTEM USING THE SAME
(KO) 다성분 단일체의 스퍼터링 타겟 및 그 제조방법, 이를 이용한 다성분 합금계 나노구조 박막 제조방법
Abstract
(EN)
PURPOSE: A multi-component unary sputtering target, a manufacturing method thereof, and a method for manufacturing nanostructured thin films with multi-component alloy system using the same are provided to form uniform nanostructured thin films without the difference of sputtering yield between components with maximized homogeneity of chemical composition. CONSTITUTION: A multi-component unary sputtering target is an amorphous forming alloy non-cristalizing or partially crystallizing nitride-forming metallic elements and non-nitride-forming metal elements The nitride-forming metallic elements are composed of at least one of Ti, Zr, Hf, V, Nb, Ta, Cr, Y, Mo, W, Al, and Si. The non-nitride-forming metallic elements are composed of at least one of Ca, Sc, La, Au, and Pb. The multi-component unary sputtering target is composed of the nitride-forming metallic elements within 40at% to 50at%. COPYRIGHT KIPO 2013 null

(KO)
본 발명은 다성분 단일체의 스퍼터링 타겟 및 그 제조방법, 이를 이용한 다성분 합금계 나노구조 박막 제조방법에 관한 것으로, 질화물형성 금속과 비질화물형성 금속으로 구성된 불용성합금계의 화학적 균일성 및 막구조 재현성을 확보하여 다양한 요구 특성을 위한 다성분 나노구조 박막을 효율적으로 형성하고, 복잡한 다원 성분계 코팅 시스템을 단일 타겟 제어를 통해 용이하게 구현하는 것에 목적이 있다. 상기 목적을 달성하기 위한 본 발명에 따른 다성분 단일체의 스퍼터링 타겟은, 질소와 반응하여 질화물 형성이 가능한 질화물형성 금속원소 및 상기 질화물형성 금속원소에 대한 고용도가 없거나 낮고 질소와 반응하지 않거나 반응성이 낮은 비질화물형성 금속원소의 비정질 또는 부분결정화된 비정질형성 합금계를 포함하는 것으로, 상기 질화물형성 금속원소는 Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, W, Al, Si로부터 선택된 적어도 하나의 원소를 포함하고, 상기 비질화물형성 금속원소는 Mg, Ca, Sc, Ni, Cu, Y, Ag, In, Sn, La, Au, Pb로부터 선택된 적어도 하나의 원소를 포함하여 구성될 수 있다.