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1. JP2011525713 - オーバレイ測定装置、リソグラフィ装置、及びそのようなオーバレイ測定装置を用いたデバイス製造方法

Office Japan
Application Number 2011515268
Application Date 14.05.2009
Publication Number 2011525713
Publication Date 22.09.2011
Publication Kind A
IPC
H01L 21/027
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
02Manufacture or treatment of semiconductor devices or of parts thereof
027Making masks on semiconductor bodies for further photolithographic processing, not provided for in group H01L21/18 or H01L21/34165
G03F 7/20
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20Exposure; Apparatus therefor
CPC
G03F 7/70633
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
70483Information management, control, testing, and wafer monitoring, e.g. pattern monitoring
70616Wafer pattern monitoring, i.e. measuring printed patterns or the aerial image at the wafer plane
70633Overlay
Applicants エーエスエムエル ネザーランズ ビー.ブイ.
Inventors デン ボーフ,アリー
Agents 稲葉 良幸
大貫 敏史
Priority Data 61/075,969 26.06.2008 US
Title
(JA) オーバレイ測定装置、リソグラフィ装置、及びそのようなオーバレイ測定装置を用いたデバイス製造方法
Abstract
(JA)

【課題】
【解決手段】オーバレイ測定装置は、試料を偏光ビームで照明する偏光光源と、試料から散乱する光を捕捉する光学システムとを有する。光学システムは、偏光ビームの偏光方向に直交する直交偏光成分を透過させる偏光子を含む。検出器は直交偏光成分の強度を測定する。処理ユニットは検出器に接続され、直交偏光成分から導出された非対称性データを用いてオーバレイ計測測定のために直交偏光成分を処理するように構成される。
【選択図】図2

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