Processing

Please wait...

Settings

Settings

Goto Application

1. JP2007521652 - エッチングプロセスのフィードフォワード、フィードバックのウェーハtoウェーハ制御方法。

Office Japan
Application Number 2006517141
Application Date 24.05.2004
Publication Number 2007521652
Publication Date 02.08.2007
Publication Kind A
IPC
H01L 21/3065
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
02Manufacture or treatment of semiconductor devices or of parts thereof
04the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer, carrier concentration layer
18the devices having semiconductor bodies comprising elements of group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20-H01L21/26142
302to change the physical characteristics of their surfaces, or to change their shape, e.g. etching, polishing, cutting
306Chemical or electrical treatment, e.g. electrolytic etching
3065Plasma etching; Reactive-ion etching
H01L 21/02
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
02Manufacture or treatment of semiconductor devices or of parts thereof
CPC
G05B 19/41875
GPHYSICS
05CONTROLLING; REGULATING
BCONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
19Programme-control systems
02electric
418Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS], computer integrated manufacturing [CIM]
41875characterised by quality surveillance of production
G05B 2219/31265
GPHYSICS
05CONTROLLING; REGULATING
BCONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
2219Program-control systems
30Nc systems
31From computer integrated manufacturing till monitoring
31265Control process by combining history and real time data
G05B 2219/32195
GPHYSICS
05CONTROLLING; REGULATING
BCONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
2219Program-control systems
30Nc systems
32Operator till task planning
32195Feedforward quality control
G05B 2219/45031
GPHYSICS
05CONTROLLING; REGULATING
BCONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
2219Program-control systems
30Nc systems
45Nc applications
45031Manufacturing semiconductor wafers
Y02P 90/02
YSECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
90Enabling technologies with a potential contribution to greenhouse gas [GHG] emissions mitigation
02Total factory control, e.g. smart factories, flexible manufacturing systems [FMS] or integrated manufacturing systems [IMS]
Applicants 東京エレクトロン株式会社
Inventors フンク、マーリット
Agents 鈴江 武彦
河野 哲
中村 誠
蔵田 昌俊
峰 隆司
福原 淑弘
白根 俊郎
村松 貞男
野河 信久
橋本 良郎
風間 鉄也
Priority Data 10/609,129 30.06.2003 US
Title
(JA) エッチングプロセスのフィードフォワード、フィードバックのウェーハtoウェーハ制御方法。
Abstract
(JA)

【課題】 エッチングプロセスのためにフィードフォワード、フィードバックウェーハtoウェーハ制御法の提供。
【解決手段】 半導体処理システムのウェーハtoウェーハ(W2W)制御を提供するように、ランtoラン(R2R)コントローラを使用する方法は、提供される。R2Rコントローラは、フィードフォワード(FF)コントローラと、プロセスモデルコントローラと、フィードバック(FB)コントローラと、プロセスコントローラとを含む。R2Rコントローラは、ウェーハtoウェーハ時間フレームにおけるプロセスレシピをアップデートするように、フィードフォワードデータと、モデリングデータと、フィードバックデータと、プロセスデータとを使用する。
【選択図】