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1. (JP2006344290) MANUFACTURING METHOD OF OPTICAL INFORMATION RECORDING MEDIUM, AND OPTICAL INFORMATION RECORDING MEDIUM

Office : Japan
Application Number: 2005168641 Application Date: 08.06.2005
Publication Number: 2006344290 Publication Date: 21.12.2006
Publication Kind : A
IPC:
G11B 7/26
G PHYSICS
11
INFORMATION STORAGE
B
INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
7
Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation, reproducing using an optical beam at lower power; Record carriers therefor
24
Record carriers characterised by shape, structure or physical properties, or by the selection of the material 
26
Apparatus or processes specially adapted for the manufacture of record carriers
Applicants: FUJIFILM HOLDINGS CORP
富士フイルムホールディングス株式会社
Inventors: USAMI YOSHIHISA
宇佐美 由久
Agents: 千葉 剛宏
宮寺 利幸
Priority Data:
Title: (EN) MANUFACTURING METHOD OF OPTICAL INFORMATION RECORDING MEDIUM, AND OPTICAL INFORMATION RECORDING MEDIUM
(JA) 光情報記録媒体の製造方法及び光情報記録媒体
Abstract: front page image
(EN) PROBLEM TO BE SOLVED: To suppress occurrence of errors by suppressing electrification of a substrate to the minimum when dispensing a UV curable liquid.

SOLUTION: The manufacturing method of an optical information recording medium includes: a substrate manufacturing process; a recording layer forming process; an edge cleaning process; a reflecting film forming process; and a protective layer forming process. Moreover, before going into the protective layer forming process and when discharging the UV curable liquid 56 from a discharge nozzle 70, a neutralizing blow 74 (ionized air) is arranged to blow on an area including the discharge nozzle 70 and the substrate 10 through a neutralizing blow device 72, and the maximum electro static charge voltage of the substrate 10 is made to 7kV or lower when dispensing the UV curable liquid 56.

COPYRIGHT: (C)2007,JPO&INPIT
(JA)

【課題】UV硬化液のディスペンス時での基板への帯電を最小限に抑えて、エラーの発生を抑圧する。
【解決手段】光情報記録媒体の製造方法は、基板作製工程と、記録層形成工程と、エッジ洗浄工程と、反射膜形成工程と、保護層形成工程とを有する。そして、保護層形成工程に入る前、並びに吐出ノズル70からUV硬化液56を吐出させる際に、除電ブロー装置72を通じて除電ブロー74(イオン化エアー)を吐出ノズル70並びに基板10を含めた領域にあてるようにし、UV硬化液56のディスペンス時での基板10の最大帯電圧が7kV以下となるようにする。
【選択図】図10