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1. (JP2004161827) UNSATURATED MONOMER HAVING FLUORINE-CONTAINING BRIDGED ALICYCLIC LACTONE STRUCTURE, ITS POLYMER, CHEMICALLY AMPLIFIED RESIST AND PATTERN-FORMING METHOD
Office : Japan
Application Number: 2002327075 Application Date: 11.11.2002
Publication Number: 2004161827 Publication Date: 10.06.2004
Publication Kind : A
IPC:
C07D307/93
C08F34/00
C07D307/94
C08G61/08
G03F7/039
H01L21/027
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
D
HETEROCYCLIC COMPOUNDS
307
Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom
77
ortho- or peri-condensed with carbocyclic rings or ring systems
93
condensed with a ring other than six-membered
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
F
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
34
Homopolymers or copolymers of cyclic compounds having no unsaturated aliphatic radicals in a side chain and having one or more carbon-to-carbon double bonds in a heterocyclic ring
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
D
HETEROCYCLIC COMPOUNDS
307
Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom
94
spiro-condensed with carbocyclic rings or ring systems, e.g. griseofulvins
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
G
MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
61
Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
02
Macromolecular compounds containing only carbon atoms in the main chain of the macromolecule, e.g. polyxylylenes
04
only aliphatic carbon atoms
06
prepared by ring-opening of carbocyclic compounds
08
of carbocyclic compounds containing one or more carbon-to-carbon double bonds in the ring
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
039
Macromolecular compounds which are photodegradable, e.g. positive electron resists
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
02
Manufacture or treatment of semiconductor devices or of parts thereof
027
Making masks on semiconductor bodies for further photolithographic processing, not provided for in group H01L21/18 or H01L21/34165
Applicants: NEC CORP
日本電気株式会社
Inventors: MAEDA KATSUMI
前田 勝美
NAKANO KAICHIRO
中野 嘉一郎
Agents: 金田 暢之
伊藤 克博
石橋 政幸
Priority Data:
Title: (EN) UNSATURATED MONOMER HAVING FLUORINE-CONTAINING BRIDGED ALICYCLIC LACTONE STRUCTURE, ITS POLYMER, CHEMICALLY AMPLIFIED RESIST AND PATTERN-FORMING METHOD
(JA) フッ素含有有橋脂環式ラクトン構造をもつ不飽和単量体、その重合体、化学増幅レジスト及びパターン形成方法
Abstract:
(EN) PROBLEM TO BE SOLVED: To provide a resin material for a chemically amplified resist which excels in the transparency to the exposure light of 190 nm, adhesion to substrate, and resistance to dry etching.

SOLUTION: The chemically amplified resist uses a polymer of an unsaturated monomer having a fluorine-containing bridged alicyclic lactone structure to be represented by formula (1) [wherein R1 and R2 are each a hydrogen atom or an alkyl group or an alkylene group forming a ring with the carbon atoms to which R1 and R2 are bonded; R3 is a hydrogen atom or a methyl group; Z1 and Z2 are each a hydrogen atom, an alkyl group, a fluorine atom, a fluorinated alkyl group or a group to be represented by formula (2) (wherein R4 and R5 are each an alkyl group or a fluorinated alkyl group, and at least one of them is a fluorinated alkyl group; and R6 is a hydrogen atom, an alkyl group or a group decomposable with an acid), and at least one of Z1 and Z2 is a fluorine atom, a fluorinated alkyl group or the group to be represented by formula (2); X is -CH2-, -CH2CH2- or -O-; and n is 0 or 1].

COPYRIGHT: (C)2004,JPO
(JA)

【課題】１９０ｎｍ以下の露光光に対する透明性、基板密着性、及びドライエッチング耐性に優れた化学増幅型レジスト用樹脂材料を提供する。
【解決手段】式（１）で表されるフッ素含有有橋脂環式ラクトン構造を有する不飽和単量体の重合体を用いる。
【化１】

Ｒ１、Ｒ２は水素原子もしくはアルキル基、またはＲ１及びＲ２が結合している炭素原子とともに環を形成するアルキレン基、Ｒ３は水素原子又はメチル基、Ｚ１、Ｚ２は水素原子、アルキル基、フッ素原子、フッ素化アルキル基又は式（２）で表される基を表し、少なくとも一方はフッ素原子、フッ素化アルキル基又は式（２）で表される基である。Ｘ：−ＣＨ２−、−ＣＨ２ＣＨ２−又は−Ｏ−、ｎ：０又は１。
【化２】

Ｒ４、Ｒ５はアルキル基またはフッ素化アルキル基を表し、少なくとも一方はフッ素化アルキル基、Ｒ６は水素原子、アルキル基または酸により分解する基を表す。
【選択図】 なし