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1. IL210126 - OVERLAY MEASUREMENT APPARATUS, LITHOGRAPHIC APPARATUS AND METHOD FOR OVERLAY MEASUREMENT

Office Israel
Application Number 210126
Application Date 20.12.2010
Publication Number 210126
Publication Date 28.02.2011
Grant Number
Grant Date 31.07.2016
Publication Kind B
IPC
G03F 07/00
CPC
G03F 7/70633
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
70483Information management, control, testing, and wafer monitoring, e.g. pattern monitoring
70616Wafer pattern monitoring, i.e. measuring printed patterns or the aerial image at the wafer plane
70633Overlay
Applicants ASML NETHERLANDS B.V.
Agents לוצאטו את לוצאטו
Priority Data 61/075969 26.06.2008 US
Title
(EN) OVERLAY MEASUREMENT APPARATUS, LITHOGRAPHIC APPARATUS AND METHOD FOR OVERLAY MEASUREMENT
(HE) מתקן למדידת כיסוי, מתקן ליטוגרפיה, ושיטה למדידת כיסוי
Abstract
(EN)

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