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1. CN110167972 - NOVEL FERROELECTRIC MATERIAL

Office China
Application Number 201880006697.X
Application Date 16.01.2018
Publication Number 110167972
Publication Date 23.08.2019
Publication Kind A
IPC
C08F 20/22
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
20Homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide, or nitrile thereof
02Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
10Esters
22Esters containing halogen
H01B 3/44
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
3Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
18mainly consisting of organic substances
30plastics; resins; waxes
44vinyl resins; acrylic resins
CPC
C08F 120/24
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
120Homopolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
02Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
10Esters
22Esters containing halogen
24containing perhaloalkyl radicals
C08F 220/24
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
220Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
02Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
10Esters
22Esters containing halogen
24containing perhaloalkyl radicals
C09D 133/16
CCHEMISTRY; METALLURGY
09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
133Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
04Homopolymers or copolymers of esters
14of esters containing halogen, nitrogen, sulfur or oxygen atoms in addition to the carboxy oxygen
16Homopolymers or copolymers of esters containing halogen atoms
H01L 29/40111
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
29Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof; ; Multistep manufacturing processes therefor
40Electrodes ; ; Multistep manufacturing processes therefor
401Multistep manufacturing processes
4011for data storage electrodes
40111the electrodes comprising a layer which is used for its ferroelectric properties
Applicants THE SCHOOL CORPORATION KANSAI UNIVERSITY
学校法人关西大学
OSAKA ORGANIC CHEMICAL INDUSTRY CO., LTD.
大阪有机化学工业株式会社
Inventors KABATA MASAYUKI
加畑雅之
MANAI DAISUKE
真井大辅
TAJITSU YOSHIRO
田实佳郎
Agents 上海专利商标事务所有限公司 31100
上海专利商标事务所有限公司 31100
Priority Data 2017-006193 17.01.2017 JP
Title
(EN) NOVEL FERROELECTRIC MATERIAL
(ZH) 新型铁电材料
Abstract
(EN)
Disclosed are: a novel polymer material for organic ferroelectric materials; and an organic ferroelectric material. This polymer material is a polymer for organic ferroelectric materials, namely a (meth)acrylate polymer which contains, as a main monomer unit, one or more (meth)acrylates that contain, in a side chain, a saturated or unsaturated hydrocarbon skeleton that is bonded to an end of an oxycarbonyl group. The hydrocarbon skeleton has at least one hydrogen atom on a carbon atom that is in the beta-position relative to the oxycarbonyl group; one or more electron-withdrawing groups selected from the group consisting of a halogen atom, a cyano group, an oxo group and a nitro group are bonded onto the beta carbon atom and/or one or more carbon atoms closer to the end than the beta carbon atom, thereby substituting the hydrogen atom; and the halogen atom is selected from among a fluorine atom and a chlorine atom.

(ZH)
本发明公开了新型有机铁电材料用聚合物材料及有机铁电材料。该材料是有机铁电材料用聚合物,其为(甲基)丙烯酸酯类聚合物,其中,该聚合物包含1种或2种以上的在侧链含有结合在氧羰基的末端侧的饱和或不饱和烃骨架的(甲基)丙烯酸酯作为主要单体单元,该烃骨架中,在相对于该氧羰基的β碳原子上具有至少1个氢原子,在该β碳原子上和/或比其靠近末端侧的1个或2个以上的碳原子上结合选自卤原子、氰基、氧代基和硝基的1个或2个以上的吸电子基团以取代氢原子,该卤原子选自氟原子和氯原子。

Also published as
EP2018742317
KR1020197023266