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1. CN102067040 - Overlay measurement apparatus, lithographic apparatus, and device manufacturing method using such overlay measurement apparatus

Office China
Application Number 200980123676.7
Application Date 14.05.2009
Publication Number 102067040
Publication Date 18.05.2011
Grant Number 102067040
Grant Date 08.05.2013
Publication Kind B
IPC
G03F 7/20
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20Exposure; Apparatus therefor
CPC
G03F 7/70633
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
70483Information management, control, testing, and wafer monitoring, e.g. pattern monitoring
70616Wafer pattern monitoring, i.e. measuring printed patterns or the aerial image at the wafer plane
70633Overlay
Applicants ASML Netherlands BV
ASML荷兰有限公司
Inventors Den Boef Arie
A·邓鲍夫
Agents wang beibei
中科专利商标代理有限责任公司 11021
Priority Data 61/075,969 26.06.2008 US
Title
(EN) Overlay measurement apparatus, lithographic apparatus, and device manufacturing method using such overlay measurement apparatus
(ZH) 重叠测量设备、光刻设备和使用这种重叠测量设备的器件制造方法
Abstract
(EN)
An overlay measurement apparatus has a polarized light source for illuminating a sample with a polarized light beam and an optical system to capture light that is scattered by the sample. The optical system includes a polarizer for transmitting an orthogonal polarization component that is orthogonal to a polarization direction of the polarized light beam. A detector measures intensity of the orthogonal polarization component. A processing unitise connected to the detector, and is arranged to process the orthogonal polarization component for overlay metrology measurement using asymmetry data derived from the orthogonal polarization component.

(ZH)

重叠测量设备具有偏振光源,用于用偏振光束照射样品,和光学系统,用以捕获由样品散射的光。光学系统包括偏振器,用于传送与偏振光束的偏振方向正交的正交偏振分量。检测器测量正交偏振分量的强度。连接至检测器的处理单元布置成使用从正交偏振分量得出的不对称数据处理重叠计算测量的正交偏振分量。

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